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Inventor

Takeo Oishi

Inventor
Tokyo, JP

Overview

3→
Patents
2012–2019
Patent span
Chemistry
Primary field (CPC C)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%
C07DHeterocyclic compounds20%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds20%
C07CAcyclic or carbocyclic compounds10%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium10%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%
PatentTitleYear
10,189,847Oxime ester compound and photopolymerization initiator containing said compound20199,594,302'Compound and photosensitive resin composition'20178,148,045'Oxime ester compound and photopolymerization initiator containing the same'2012

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2012–2019Patents assigned to ADEKA CORP (3)· patent assignee history
2012Patents assigned to KIMIJIMA KOICHI (1)· patent assignee history
2012Patents assigned to MURATA KIYOSHI (1)· patent assignee history
2012Patents assigned to OISHI TAKEO (1)· patent assignee history
2012–2019Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ADEKA CORP32012–2019
KIMIJIMA KOICHI12012
MURATA KIYOSHI12012
OISHI TAKEOself12012
Locations
LocationPatentsSpan
Tokyo, JP32012–2019