Inventor
E. Noel Abarra
Inventor
Hachioji, JP
Overview
40→
Patents
2003–2018
Patent span
General tagging of new technological developments
Primary field (CPC Y)
Patents· 40 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G11Bprimary
G11BInformation storage based on relative movement between record carrier and transducer25%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests17%
H01JElectric discharge tubes or discharge lamps16%
Y10TTechnical subjects covered by former us classification16%
C23CCoating metallic material7%
H01FMagnets6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%
B82YSpecific uses or applications of nanostructures2%
G05BControl or regulating systems in general2%
H01LSemiconductor devices2%
PatentTitleYear
10,062,545Apparatus and method for processing substrate using ion beam20189,911,526'Magnet unit and magnetron sputtering apparatus'20189,422,623'Ion beam generator and ion beam plasma processing apparatus'20169,355,878'Substrate processing apparatus'20169,312,102'Apparatus and method for processing substrate using ion beam'20169,058,962'Magnet unit and magnetron sputtering apparatus'20159,005,781'Magnetic recording medium for perpendicular magnetic recording'20158,999,121'Sputtering apparatus'20158,778,150'Magnetron sputtering cathode, magnetron sputtering apparatus, and method of manufacturing magnetic device'20148,776,542'Cooling system'20148,673,124'Magnet unit and magnetron sputtering apparatus'20148,536,539'Ion beam generator, and substrate processing apparatus and production method of electronic device using the ion beam generator'20138,507,113'Magnetic sensor stack body, method of forming the same, film formation control program, and recording medium'20138,378,576'Ion beam generator'20138,277,962'Magnetic recording medium for perpendicular magnetic recording'20128,110,298'Media for high density perpendicular magnetic recording'20128,092,139'Inline-type wafer conveyance device'20128,053,747'Substrate processing apparatus and cleaning method of the same'20118,048,277'Magnet unit and magnetron sputtering apparatus'20118,043,483'Film forming method by sputtering and sputtering apparatus thereof'20118,016,537'Inline-type wafer conveyance device'20117,955,480'Sputtering apparatus and film deposition method'20117,901,802'Magnetic recording medium for perpendicular magnetic recording'20117,796,358'Method and apparatus for eliminating spike noise in a soft magnetic underlayer'20107,588,842'Perpendicular magnetic recording medium with a pinned soft underlayer'20097,566,507'Magnetic recording medium, magnetic storage apparatus and method of producing magnetic recording medium'20097,354,665'Magnetic recording medium and magnetic storage apparatus'20087,264,892'Magnetic recording medium and magnetic storage apparatus'20076,893,735'Magnetic recording medium with anti-ferromagnetically coupled magnetic layers, and magnetic storage apparatus'20056,828,047'Magnetic recording medium and magnetic storage apparatus'20046,821,652'Magnetic recording medium and magnetic storage apparatus'20046,773,833'Magnetic storage medium having improved thermal stability and a magnetic storage device using such a high-density magnetic storage medium'20046,753,101'Magnetic recording medium, magnetic storage apparatus, recording method and method of producing magnetic recording medium'20046,689,495'Magnetic recording medium and magnetic storage apparatus'20046,645,646'Magnetic recording medium and magnetic storage apparatus'20036,623,875'Magnetic recording medium and magnetic storage apparatus'20036,613,460'Magnetic recording medium and magnetic storage apparatus'20036,610,424'Magnetic recording medium and magnetic storage apparatus'20036,602,612'Magnetic recording medium and magnetic storage apparatus'20036,562,489'Magnetic recording medium and magnetic storage apparatus'2003Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2003–2009Patents assigned to FUJITSU LTD (15)· patent assignee history
2003–2016Based in Kawasaki, JP· patent location history
2007–2012Based in Santa Clara, CA, US· patent location history
2010–2015Patents assigned to SEAGATE TECHNOLOGY LLC (5)· patent assignee history
2011–2018Patents assigned to CANON ANELVA CORP (18)· patent assignee history
2011–2018Based in Hachioji, JP· patent location history
2011–2015Based in Tokyo, JP· patent location history
2012–2016Patents assigned to ABARRA EINSTEIN NOEL (10)· patent assignee history
2013–2015Patents assigned to ENDO TETSUYA (6)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CANON ANELVA CORP | 18 | 2011–2018 |
| FUJITSU LTD | 15 | 2003–2009 |
| ABARRA EINSTEIN NOELself | 10 | 2012–2016 |
| ENDO TETSUYA | 6 | 2013–2015 |
| SEAGATE TECHNOLOGY LLC | 5 | 2010–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hachioji, JP | 16 | 2011–2018 |
| Kawasaki, JP | 14 | 2003–2016 |
| Santa Clara, California, US | 6 | 2007–2012 |
| Tokyo, JP | 4 | 2011–2015 |