Inventor

Wei-Ming You

Inventor
Taipei, TW

Overview

24→
Patents
2003–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 24 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
H01LSemiconductor devices19%
H10DInorganic electric semiconductor devices19%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1011%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation5%
H01JElectric discharge tubes or discharge lamps3%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution3%
B23KSoldering or unsoldering2%
B41MPrinting, duplicating, marking, or copying processes2%
B62DMotor vehicles2%
PatentTitleYear
11,024,716Semiconductor structure and method for forming the same202111,018,022Method for forming semiconductor device structure having oxide layer202110,504,998Semiconductor structure and method of forming the same201910,453,933Barrier layer for dielectric layers in semiconductor devices201910,347,720Doping for semiconductor device with conductive feature201910,192,985FinFET with doped isolation insulating layer201910,164,095FinFET with doped isolation insulating layer201810,062,787FinFET20189,768,261'Semiconductor structure and method of forming the same'20179,716,090'FinFet structure'20179,697,989'Method for generating parameter pattern, ion implantation method and feed forward semiconductor manufacturing method'20179,574,958'Torque sensor'20179,577,102'Method of forming gate and finFET'20179,508,548'Method for forming barrier layer for dielectric layers in semiconductor devices'20169,406,675'FinFET structure and method of manufacturing the same'20168,860,101'Image sensor cross-talk reduction system'20148,652,868'Implanting method for forming photodiode'20148,628,998'Annealing methods for backside illumination image sensor chips'20148,129,203'Auto feedback apparatus for laser marking'20127,973,293'Implantation quality improvement by xenon/hydrogen dilution gas'20117,368,303'Method for temperature control in a rapid thermal processing system'20086,777,251'Metrology for monitoring a rapid thermal annealing process'20046,710,889'Method for improved dielectric layer metrology calibration'20046,647,998'Electrostatic charge-free solvent-type dryer for semiconductor wafers'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2003–2014Patents assigned to TAIWAN SEMICONDUCTOR MFG (9)· patent assignee history
2003–2021Based in Taipei, TW· patent location history
2012–2014Patents assigned to YOU WEI-MING (4)· patent assignee history
2014Patents assigned to JENG CHIH-CHERNG (3)· patent assignee history
2014Patents assigned to SU CHING-HWANQ (3)· patent assignee history
2016–2021Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (13)· patent assignee history
2017Based in Chengdu, CN· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG CO LTD132016–2021
TAIWAN SEMICONDUCTOR MFG92003–2014
YOU WEI-MINGself42012–2014
JENG CHIH-CHERNG32014
SU CHING-HWANQ32014
Locations
LocationPatentsSpan
Taipei, TW232003–2021
Chengdu, CN12017