Inventor
TAKAYUKI TOSHIMA
Inventor
JP
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1030%
C11DDetergent compositions20%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
H01LSemiconductor devices20%
B08BCleaning in general10%
PatentTitleYear
11,551,931Substrate processing apparatus, substrate processing method, and storage medium storing program for executing substrate processing method202311,441,101Cleaning composition, cleaning method, and method for manufacturing semiconductor202211,355,362Washing method, washing device, storage medium, and washing composition2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2023Patents assigned to TOKYO ELECTRON LTD (3)· patent assignee history
2022Patents assigned to TOKYO OHKA KOGYO CO LTD (2)· patent assignee history
2022–2023Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 3 | 2022–2023 |
| TOKYO OHKA KOGYO CO LTD | 2 | 2022 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 3 | 2022–2023 |