Inventor
Johannes Anna Quaedackers
Inventor
Veldhoven, NL
Overview
Patents· 24 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices42%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1021%
G01BMeasuring length, thickness or similar linear dimensions18%
G06TImage data processing or generation, in general5%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
G02BOptical elements, systems or apparatus3%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them3%
H04NPictorial communication, e.g. television3%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
PatentTitleYear
10,838,310Lithographic apparatus and device manufacturing method involving a heater202010,794,688Optical interference measuring device202010,636,157Method and system for calculating a height map of a surface of an object from an image stack in scanning optical 2.5D profiling of the surface by an optical system202010,563,974Method for measuring a height map of multiple fields of view and combining them to a composite height map with minimized sensitivity to instrument drift202010,302,415Method for calculating a height map of a body of transparent material having an inclined or curved surface201910,254,663Lithographic apparatus and device manufacturing method involving a heater201910,024,648Interference measuring device and method of measurement using the same device20189,881,400'Method for measuring a high accuracy height map of a test surface'20189,436,099'Lithographic focus and dose measurement using a 2-D target'20169,268,242'Lithographic apparatus and device manufacturing method involving a heater and a temperature sensor'20169,188,880'Lithographic apparatus and device manufacturing method involving a heater'20159,103,651'Method and apparatus for determining a property of a surface'20158,982,328'Method and apparatus for overlay measurement'20158,891,061'Lithographic focus and dose measurement using a 2-D target'20148,685,626'Method of measuring a characteristic'20148,502,955'Method of determining a characteristic'20138,435,593'Method of inspecting a substrate and method of preparing a substrate for lithography'20138,119,333'Lithographic method'20127,992,115'Overlay measurement on double patterning substrate'20117,804,575'Lithographic apparatus and device manufacturing method having liquid evaporation control'20107,670,731'Method for exposing a substrate and lithographic projection apparatus'20107,596,420'Device manufacturing method and computer program product'20097,382,438'Lithographic apparatus and device manufacturing method'20087,307,687'Lithographic apparatus, device manufacturing method and substrate'2007Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2007–2020Patents assigned to ASML NETHERLANDS BV (17)· patent assignee history
2007–2020Based in Veldhoven, NL· patent location history
2010–2020Based in Nijmegen, NL· patent location history
2012–2016Patents assigned to QUAEDACKERS JOHANNES ANNA (8)· patent assignee history
2013–2015Patents assigned to LEEWIS CHRISTIAN MARINUS (4)· patent assignee history
2015–2020Patents assigned to MITUTOYO CORP (7)· patent assignee history
2015–2016Patents assigned to BOOM HERMAN (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 17 | 2007–2020 |
| QUAEDACKERS JOHANNES ANNAself | 8 | 2012–2016 |
| MITUTOYO CORP | 7 | 2015–2020 |
| LEEWIS CHRISTIAN MARINUS | 4 | 2013–2015 |
| BOOM HERMAN | 2 | 2015–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Veldhoven, NL | 19 | 2007–2020 |
| Nijmegen, NL | 5 | 2010–2020 |