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Inventor

Long Lin

Inventor
Sunnyvale, CA, US

Overview

2→
Patents
2004–2019
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
C23CCoating metallic material13%
G05DSystems for controlling or regulating non-electric variables13%
H01JElectric discharge tubes or discharge lamps13%
H01LSemiconductor devices13%
H10KOrganic electric solid-state devices13%
Y10TTechnical subjects covered by former us classification13%
PatentTitleYear
10,490,467Methods of forming a stack of multiple deposited semiconductor layers20196,711,956'Method and apparatus for regulating exhaust pressure in evacuation system of semiconductor process chamber'2004

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2004Patents assigned to MACRONIX INT CO LTD (1)· patent assignee history
2004Based in Hsinchu, TW· patent location history
2019Patents assigned to APPLIED MATERIALS INC (1)· patent assignee history
2019Based in Sunnyvale, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC12019
MACRONIX INT CO LTD12004
Locations
LocationPatentsSpan
Sunnyvale, California, US12019
Hsinchu, TW12004