Inventor
Shing-Li Sung
Inventor
Hsinchu, TW
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
B82YSpecific uses or applications of nanostructures10%
C01BNon-metallic elements10%
C23CCoating metallic material10%
D01FChemical features in the manufacture of artificial filaments, threads, fibres, bristles or ribbons10%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1010%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%
PatentTitleYear
7,510,976'Dielectric plasma etch process with in-situ amorphous carbon mask with improved critical dimension and etch selectivity'20097,432,210'Process to open carbon based hardmask'20086,346,303'Process for synthesizing one-dimensional nanosubstances by electron cyclotron resonance chemical vapor deposition'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2008Based in Hsinchu, TW· patent location history
2008–2009Patents assigned to APPLIED MATERIALS INC (2)· patent assignee history
2009Based in Campbell, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 2 | 2008–2009 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hsinchu, TW | 2 | 2002–2008 |
| Campbell, California, US | 1 | 2009 |