Inventor
J. Joseph Armstrong
Inventor
Milpitas, CA, US
Overview
Patents· 70 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G02Bprimary
G02BOptical elements, systems or apparatus25%
G01NInvestigating or analysing materials by determining their chemical or physical properties17%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light17%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices16%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein10%
C03BManufacture, shaping, or supplementary processes2%
C30BSingle-crystal growth2%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests2%
C23CCoating metallic material1%
F02MSupplying combustion engines in general with combustible mixtures or constituents thereof1%
PatentTitleYear
10,439,355193nm laser and inspection system201910,199,149183NM laser and inspection system201910,193,293Semiconductor inspection and metrology system using laser pulse multiplier201910,044,164Laser repetition rate multiplier and flat-top beam profile generators using mirrors and/or prisms20189,972,959Semiconductor inspection and metrology system using laser pulse multiplier20189,935,421193nm laser and inspection system20189,793,673'Semiconductor inspection and metrology system using laser pulse multiplier'20179,768,577'Semiconductor inspection and metrology system using laser pulse multiplier'20179,753,352'High damage threshold frequency conversion system'20179,748,729'183NM laser and inspection system'20179,608,399'193 nm laser and an inspection system using a 193 nm laser'20179,529,182'193nm laser and inspection system'20169,525,265'Laser repetition rate multiplier and flat-top beam profile generators using mirrors and/or prisms'20169,477,041'Low stray light beam dump with fiber delivery'20169,419,407'Laser assembly and inspection system using monolithic bandwidth narrowing apparatus'20169,413,134'Multi-stage ramp-up annealing for frequency-conversion crystals'20169,377,610'External beam delivery system for laser dark-field illumination in a catadioptric optical system'20169,318,869'193nm laser and inspection system'20169,209,589'Reducing the spectral bandwidth of lasers'20159,151,940'Semiconductor inspection and metrology system using laser pulse multiplier'20159,152,008'High damage threshold frequency conversion system'20159,097,683'Laser with high quality, stable output beam, and long life high conversion efficiency non-linear crystal'20159,042,006'Solid state illumination source and inspection system'20158,964,798'Reducing the spectral bandwidth of lasers'20158,929,406'193NM laser and inspection system'20158,896,917'External beam delivery system using catadioptric objective with aspheric surfaces'20148,873,596'Laser with high quality, stable output beam, and long life high conversion efficiency non-linear crystal'20148,824,514'Measuring crystal site lifetime in a non-linear optical crystal'20148,711,470'High damage threshold frequency conversion system'20148,686,331'Dynamic wavefront control of a frequency converted laser system'20148,675,276'Catadioptric imaging system for broad band microscopy'20148,665,536'External beam delivery system for laser dark-field illumination in a catadioptric optical system'20148,298,335'Enclosure for controlling the environment of optical crystals'20127,957,066'Split field inspection system using small catadioptric objectives'20117,924,892'Fiber amplifier based light source for semiconductor inspection'20117,884,998'Catadioptric microscope objective employing immersion liquid for use in broad band microscopy'20117,869,121'Small ultra-high NA catadioptric objective using aspheric surfaces'20117,817,260'Beam delivery system for laser dark-field illumination in a catadioptric optical system'20107,728,968'Excimer laser inspection system'20107,679,842'High performance catadioptric imaging system'20107,672,043'Catadioptric imaging system exhibiting enhanced deep ultraviolet spectral bandwidth'20107,646,533'Small ultra-high NA catadioptric objective'20107,639,419'Inspection system using small catadioptric objective'20097,633,675'Catadioptric imaging system employing immersion liquid for use in broad band microscopy'20097,627,007'Non-critical phase matching in CLBO to generate sub-213nm wavelengths'20097,609,373'Reducing variations in energy reflected from a sample due to thin film interference'20097,518,789'Broad band deep ultraviolet/vacuum ultraviolet catadioptric imaging system'20097,474,461'Broad band objective having improved lateral color performance'20097,465,913'System and method for sensing using adjustable modulation transfer function (MTF) with voltage variations relative to depletion depth at a pixel'20087,457,034'High NA system for multiple mode imaging'20087,449,673'Peak power and speckle contrast reduction for a single layer pulse'20087,345,825'Beam delivery system for laser dark-field illumination in a catadioptric optical system'20087,307,783'Catadioptric imaging system employing immersion liquid for use in broad band microscopy'20077,245,438'Broad band objective having improved lateral color performance'20077,187,500'Peak power and speckle contrast reduction for a single layer pulse'20077,180,658'High performance catadioptric imaging system'20077,136,159'Excimer laser inspection system'20067,126,100'System and method for sensing using adjustable modulation transfer function (MTF)'20067,035,001'High NA system for multiple mode imaging'20066,801,358'Broad band deep ultraviolet/vacuum ultraviolet catadioptric imaging system'20046,693,930'Peak power and speckle contrast reduction for a single laser pulse'20046,560,011'High NA system for multiple mode imaging'20036,512,631'Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system'20036,392,793'High NA imaging system'20026,137,570'System and method for analyzing topological features on a surface'20006,064,517'High NA system for multiple mode imaging'20004,190,951'Method for facilitating attachment of wires to a motherboard'19804,104,702'Keyboard apparatus including elongated bar for aligning level from connectors to motherboard'19784,083,336'Condition responsive control device'19784,058,097'Choke control'1977Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1977–1980Patents assigned to TEXAS INSTRUMENTS INC (4)· patent assignee history
1977–1980Based in Seekonk, MA, US· patent location history
1978Based in East Providence, RI, US· patent location history
2000–2019Patents assigned to KLA TENCOR CORP (44)· patent assignee history
2000–2016Based in Milpitas, CA, US· patent location history
2000–2009Based in Milipitas, CA, US· patent location history
2004–2012Patents assigned to KLA TENCOR TECH CORP (21)· patent assignee history
2012–2017Patents assigned to ARMSTRONG J JOSEPH (10)· patent assignee history
2014–2017Patents assigned to CHUANG YUNG-HO (2)· patent assignee history
2014–2019Based in Fremont, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KLA TENCOR CORP | 44 | 2000–2019 |
| KLA TENCOR TECH CORP | 21 | 2004–2012 |
| ARMSTRONG J JOSEPHself | 10 | 2012–2017 |
| TEXAS INSTRUMENTS INC | 4 | 1977–1980 |
| CHUANG YUNG-HO | 2 | 2014–2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Milpitas, California, US | 30 | 2000–2016 |
| Fremont, California, US | 28 | 2014–2019 |
| Milipitas, California, US | 8 | 2000–2009 |
| Seekonk, Massachusetts, US | 3 | 1977–1980 |
| East Providence, RI, US | 1 | 1978 |