Inventor
Guanyang Lin
Inventor
Whitehouse Station, NJ, US
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices23%
C09DCoating compositions, e.g. paints, varnishes or lacquers15%
C08LCompositions of macromolecular compounds13%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds9%
B82YSpecific uses or applications of nanostructures6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds5%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients4%
H01LSemiconductor devices4%
B05DProcesses for applying fluent materials to surfaces, in general3%
PatentTitleYear
10,457,088Template for self assembly and method of making a self assembled pattern201910,259,907Block copolymers with surface-active junction groups, compositions and processes thereof201910,155,879Compositions and use thereof for modification of substrate surfaces20189,574,104'Compositions and processes for self-assembly of block copolymers'20179,505,945'Silicon containing block copolymers for direct self-assembly application'20169,181,449'Underlayer composition for promoting self assembly and method of making and using'20159,170,494'Antireflective compositions and methods of using same'20159,093,263'Underlayer composition for promoting self assembly and method of making and using'20159,052,598'Compositions of neutral layer for directed self assembly block copolymers and processes thereof'20158,835,581'Neutral layer polymer composition for directed self assembly and processes thereof'20148,691,925'Compositions of neutral layer for directed self assembly block copolymers and processes thereof'20148,568,958'Underlayer composition and process thereof'20138,551,686'Antireflective composition for photoresists'20138,507,192'Antireflective compositions and methods of using same'20138,486,609'Antireflective coating composition and process thereof'20138,465,902'Underlayer coating composition and processes thereof'20138,445,181'Antireflective coating composition and process thereof'20138,329,387'Antireflective coating compositions'20127,122,291'Photoresist compositions'2006Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2006–2013Patents assigned to AZ ELECTRONIC MATERIALS USA (8)· patent assignee history
2006Based in Bridgewater, NJ, US· patent location history
2012–2019Patents assigned to LIN GUANYANG (14)· patent assignee history
2012–2015Patents assigned to YAO HUIRONG (8)· patent assignee history
2012–2019Patents assigned to WU HENGPENG (6)· patent assignee history
2012–2019Based in Whitehouse Station, NJ, US· patent location history
2014–2015Patents assigned to AZ ELECTRONIC MATERIALS LUXEMBOURG SARL (6)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LIN GUANYANGself | 14 | 2012–2019 |
| AZ ELECTRONIC MATERIALS USA | 8 | 2006–2013 |
| YAO HUIRONG | 8 | 2012–2015 |
| AZ ELECTRONIC MATERIALS LUXEMBOURG SARL | 6 | 2014–2015 |
| WU HENGPENG | 6 | 2012–2019 |
Locations
| Location | Patents | Span |
|---|---|---|
| Whitehouse Station, New Jersey, US | 18 | 2012–2019 |
| Bridgewater, New Jersey, US | 1 | 2006 |