Inventor

Yoichi Kamoshida

Inventor

Yokohama, JP

Overview

1981–1997

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices37%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds16%

C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients16%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests16%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds5%

C08LCompositions of macromolecular compounds5%

G03CPhotosensitive materials for photographic purposes5%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

1981–1997Patents assigned to JAPAN SYNTHETIC RUBBER CO LTD (10)· patent assignee history

1981–1991Based in Yokohama, JP· patent location history

1993–1995Patents assigned to TOSHIBA SILICONE (2)· patent assignee history

1993Based in Mie, JP· patent location history

1995–1997Based in Tokyo, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
JAPAN SYNTHETIC RUBBER CO LTD	10	1981–1997
TOSHIBA SILICONE	2	1993–1995

Locations