Inventor
BYEONG-IL YANG
Inventor
KR
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material18%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium15%
H01LSemiconductor devices15%
C01BNon-metallic elements10%
C09DCoating compositions, e.g. paints, varnishes or lacquers8%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds3%
C08LCompositions of macromolecular compounds3%
C23FNon-mechanical removal of metallic material from surface3%
H10DInorganic electric semiconductor devices3%
PatentTitleYear
12,518,963Composition for depositing silicon-containing thin film and method for manufacturing silicon-containing thin film using the same202612,398,459Silicon metal oxide encapsulation film comprising metal or metal oxide in thin film, and manufacturing method therefor202512,255,075Atomic layer etching method using ligand exchange reaction202511,901,191Atomic layer etching method and semiconductor device manufacturing method using the same202411,749,522Composition for depositing silicon-containing thin film containing bis(aminosilyl)alkylamine compound and method for manufacturing silicon-containing thin using the same202311,393,676Composition for depositing silicon-containing thin film containing bis(aminosilyl)alkylamine compound and method for manufacturing silicon-containing thin film using the same202211,390,635Composition for depositing silicon-containing thin film and method for producing silicon-containing thin film using the same202211,358,974Silylamine compound, composition for depositing silicon-containing thin film containing the same, and method for manufacturing silicon-containing thin film using the composition202211,319,333Disilylamine compound, method for preparing the same, and composition for depositing silicon-containing thin film including the same2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2026Patents assigned to DNF CO LTD (8)· patent assignee history
2022–2026Based in KR· patent location history
2024Patents assigned to SAMSUNG ELECTRONICS CO LTD (1)· patent assignee history
2025Patents assigned to MERCK PATENT GMBH (1)· patent assignee history
2025Patents assigned to SK HYNIX INC (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| DNF CO LTD | 8 | 2022–2026 |
| MERCK PATENT GMBH | 1 | 2025 |
| SAMSUNG ELECTRONICS CO LTD | 1 | 2024 |
| SK HYNIX INC | 1 | 2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| KR | 9 | 2022–2026 |