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Inventor

Andrzej Bartnik

Inventor
Warsaw, PL

Overview

2→
Patents
2002
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
H05GX-ray technique33%
B82YSpecific uses or applications of nanostructures17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
PatentTitleYear
6,469,310'Radiation source for extreme ultraviolet radiation, e.g. for use in lithographic projection apparatus'20026,452,194'Radiation source for use in lithographic projection apparatus'2002

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002Patents assigned to ASML NETHERLANDS BV (2)· patent assignee history
2002Based in Warsaw, PL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV22002
Locations
LocationPatentsSpan
Warsaw, PL22002