Inventor
Tadateru Yatsuo
Inventor
Shizuoka, JP
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds17%
C09DCoating compositions, e.g. paints, varnishes or lacquers13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests9%
C08JWorking-up4%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients4%
C08LCompositions of macromolecular compounds4%
H01LSemiconductor devices4%
Y10TTechnical subjects covered by former us classification4%
PatentTitleYear
10,007,180Negative resist composition, resist film using same, pattern forming method, and mask blank provided with resist film20189,625,813'Chemical amplification resist composition, resist film using the composition, resist-coated mask blanks, resist pattern forming method, photomask and polymer compound'20179,034,560'Negative resist composition and pattern forming method using the same'20158,889,339'Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanks'20148,778,593'Chemical amplification resist composition, and resist film, resist-coated mask blank, resist pattern forming method and photomask each using the composition'20148,735,048'Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method'20148,637,222'Negative resist pattern forming method, developer and negative chemical-amplification resist composition used therefor, and resist pattern'2014Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2014–2018Patents assigned to FUJIFILM CORP (7)· patent assignee history
2014Patents assigned to YATSUO TADATERU (4)· patent assignee history
2014Patents assigned to TSUCHIMURA TOMOTAKA (3)· patent assignee history
2014Patents assigned to TAKAHASHI KOUTAROU (2)· patent assignee history
2014Patents assigned to TSUCHIHASHI TORU (2)· patent assignee history
2014–2018Based in Shizuoka, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJIFILM CORP | 7 | 2014–2018 |
| YATSUO TADATERUself | 4 | 2014 |
| TSUCHIMURA TOMOTAKA | 3 | 2014 |
| TAKAHASHI KOUTAROU | 2 | 2014 |
| TSUCHIHASHI TORU | 2 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Shizuoka, JP | 7 | 2014–2018 |