Inventor
Hitoshi Mitani
Inventor
Kanagawa, JP
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H04Nprimary
H04NPictorial communication, e.g. television21%
H10BElectronic memory devices13%
H10DInorganic electric semiconductor devices13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light5%
G01SRadio direction-finding5%
G02BOptical elements, systems or apparatus5%
G11CStatic stores5%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
PatentTitleYear
11,056,518Imaging apparatus and imaging method202110,877,288Imaging device and imaging method202010,776,901Processing device, processing method, and non-transitory computer-readable medium program with output image based on plurality of predetermined polarization directions and plurality of predetermined wavelength bands202010,704,957Imaging device and imaging method20208,098,324'Imaging device, GPS control method, and computer program'20128,068,699'Imaging apparatus and imaging method'20117,948,063'Semiconductor device with stress control film utilizing film thickness'20117,875,954'Semiconductor chip'20117,843,506'Imaging device, GPS control method, and computer program'20107,745,936'Semiconductor integrated circuit device'20106,466,233'Information processing unit for controlling a plurality of electronic devices and method thereof, and provision medium associated therewith'20026,031,291'Common contact hole structure in semiconductor device'20005,949,113'Static RAM having a stable high-resistance load'19995,895,238'Doping technique for MOS devices'19995,770,495'Method of fabricating semiconductor device including high temperature heat treatment'19985,761,113'Soft error suppressing resistance load type SRAM cell'19985,757,694'Balanced resistance load type SRAM cell'19985,287,733'Apparatus for receiving liquid treatment samples for disposal'1994Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994Patents assigned to ABX SA (1)· patent assignee history
1994Based in Kyoto, JP· patent location history
1998–2000Patents assigned to NEC CORP (6)· patent assignee history
1998–2000Based in Tokyo, JP· patent location history
2002–2021Patents assigned to SONY CORP (8)· patent assignee history
2002–2020Based in Kanagawa, JP· patent location history
2011–2012Patents assigned to MITANI HITOSHI (2)· patent assignee history
2011Patents assigned to RENESAS ELECTRONICS CORP (2)· patent assignee history
2021Based in Yokohama-shi, Kanagawa, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SONY CORP | 8 | 2002–2021 |
| NEC CORP | 6 | 1998–2000 |
| MITANI HITOSHIself | 2 | 2011–2012 |
| RENESAS ELECTRONICS CORP | 2 | 2011 |
| ABX SA | 1 | 1994 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kanagawa, JP | 10 | 2002–2020 |
| Tokyo, JP | 6 | 1998–2000 |
| Yokohama-shi, Kanagawa, JP | 1 | 2021 |
| Kyoto, JP | 1 | 1994 |