LexDanaLexDanabeta
Inventor

Liangzhi Xie

Inventor
Shanghai, CN

Overview

9→
Patents
2008–2019
Patent span
Electricity
Primary field (CPC H)

Patents· 9 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1042%
H01LSemiconductor devices26%
B08BCleaning in general21%
C12NMicroorganisms or enzymes5%
H10DInorganic electric semiconductor devices5%
PatentTitleYear
10,297,472Method and apparatus for cleaning semiconductor wafer201910,020,208Methods and apparatus for cleaning semiconductor wafers20189,633,833'Methods and apparatus for cleaning semiconductor wafers'20179,595,457'Methods and apparatus for cleaning semiconductor wafers'20179,492,852'Methods and apparatus for cleaning semiconductor wafers'20168,671,961'Methods and apparatus for cleaning semiconductor wafers'20148,598,039'Barrier layer removal method and apparatus'20138,580,042'Methods and apparatus for cleaning semiconductor wafers'20137,344,873'Methods of adenovirus production'2008

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2008Based in North Wales, PA, US· patent location history
2013–2019Patents assigned to ACM RESEARCH SHANGHAI INC (8)· patent assignee history
2013–2017Patents assigned to WANG JIAN (4)· patent assignee history
2013–2017Patents assigned to XIE LIANGZHI (4)· patent assignee history
2013–2017Patents assigned to HUANG YUNWEN (3)· patent assignee history
2013–2017Patents assigned to JIA ZHAOWEI (3)· patent assignee history
2013–2019Based in Shanghai, CN· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ACM RESEARCH SHANGHAI INC82013–2019
WANG JIAN42013–2017
XIE LIANGZHIself42013–2017
HUANG YUNWEN32013–2017
JIA ZHAOWEI32013–2017
Locations
LocationPatentsSpan
Shanghai, CN82013–2019
North Wales, Pennsylvania, US12008