Inventor
NICOLAAS RUDOLF KEMPER
Inventor
NL
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices64%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them18%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
PatentTitleYear
12,117,721Lithographic apparatus and device manufacturing method202412,072,635Lithographic apparatus and a method of operating the apparatus202411,789,369Lithographic apparatus and device manufacturing method202311,537,038Lithographic apparatus and device manufacturing method202211,209,738Lithographic apparatus and device manufacturing method202111,187,991Lithographic apparatus and a method of operating the apparatus202111,143,968Fluid handling structure, lithographic apparatus and device manufacturing method2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2024Patents assigned to ASML NETHERLANDS BV (7)· patent assignee history
2021–2024Based in NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 7 | 2021–2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| NL | 7 | 2021–2024 |