Inventor

Anantha K. Subramani

Inventor

San Jose, CA, US

Overview

63→

Patents

2000–2021

Patent span

Electricity

Primary field (CPC H)

Patents· 63 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary

H01JElectric discharge tubes or discharge lamps22%

C23CCoating metallic material20%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%

H01LSemiconductor devices16%

H10DInorganic electric semiconductor devices6%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%

H10HInorganic light-emitting semiconductor devices having potential barriers4%

H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation3%

Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution3%

B82YSpecific uses or applications of nanostructures1%

PatentTitleYear

11,101,117Methods and apparatus for co-sputtering multiple targets2021 11,081,623Oxygen controlled PVD AlN buffer for GaN-based optoelectronic and electronic devices2021 11,043,364Process kit for multi-cathode processing chamber2021 11,011,676PVD buffer layers for LED fabrication2021 11,011,357Methods and apparatus for multi-cathode substrate processing2021 10,957,565Processing tool having a monitoring device2021 10,927,449Extension of PVD chamber with multiple reaction gases, high bias power, and high power impulse source for deposition, implantation, and treatment2021 10,903,067Cooled reflective adapter plate for a deposition chamber2021 10,903,056Plasma source for rotating susceptor2021 10,879,042Symmetric plasma source to generate pie shaped treatment2020 10,763,143Processing tool having a monitoring device2020 10,763,085Shaped electrodes for improved plasma exposure from vertical plasma source2020 10,697,061Two zone flow cooling plate design with concentric or spiral channel for efficient gas distribution assembly cooling2020 10,597,785Single oxide metal deposition chamber2020 10,577,689Sputtering showerhead2020 10,546,973Oxygen controlled PVD AlN buffer for GaN-based optoelectronic and electronic devices2020 10,504,719Cooled reflective adapter plate for a deposition chamber2019 10,490,434Biasable rotatable electrostatic chuck2019 10,468,238Methods and apparatus for co-sputtering multiple targets2019 10,431,440Methods and apparatus for processing a substrate2019 10,395,893Dual-feed tunable plasma source2019 10,249,522In-situ temperature measurement in a noisy environment2019 10,236,412Oxygen controlled PVD AlN buffer for GaN-based optoelectronic and electronic devices2019 10,193,014Oxygen controlled PVD AlN buffer for GaN-based optoelectronic and electronic devices2019 10,121,655Lateral plasma/radical source2018 10,109,481Aluminum-nitride buffer and active layers by physical vapor deposition2018 9,929,310'Oxygen controlled PVD aluminum nitride buffer for gallium nitride-based optoelectronic and electronic devices'2018 9,905,443'Reflective deposition rings and substrate processing chambers incorporating same'2018 9,863,038'Off-angled heating of the underside of a substrate using a lamp assembly'2018 9,853,579Rotatable heated electrostatic chuck2017 9,818,587'Off-angled heating of the underside of a substrate using a lamp assembly'2017 9,673,074'In-situ temperature measurement in a noisy environment'2017 9,666,416'Apparatus and method for depositing electronically conductive pasting material'2017 9,620,339'Sputter source for semiconductor process chambers'2017 9,476,122'Wafer processing deposition shielding components'2016 9,466,524'Method of depositing metals using high frequency plasma'2016 9,396,933'PVD buffer layers for LED fabrication'2016 9,376,752'Edge ring for a deposition chamber'2016 9,224,582'Apparatus and method for depositing electrically conductive pasting material'2015 9,062,379'Wafer processing deposition shielding components'2015 8,765,601'Post deposition treatments for CVD cobalt films'2014 8,696,878'Wafer processing deposition shielding components'2014 8,685,215'Mechanism for continuously varying radial position of a magnetron'2014 8,637,410'Method for metal deposition using hydrogen plasma'2014 8,524,600'Post deposition treatments for CVD cobalt films'2013 8,404,048'Off-angled heating of the underside of a substrate using a lamp assembly'2013 D0665491'Deposition chamber cover ring'2012 D0665071'Deposition chamber liner'2012 7,736,473'Magnetron having continuously variable radial position'2010 7,718,045'Ground shield with reentrant feature'2010 7,297,247'Electroformed sputtering target'2007 7,163,607'Process kit for improved power coupling through a workpiece in a semiconductor wafer processing system'2007 7,018,515'Selectable dual position magnetron'2006 6,899,796'Partially filling copper seed layer'2005 6,884,329'Diffusion enhanced ion plating for copper fill'2005 6,790,326'Magnetron for a vault shaped sputtering target having two opposed sidewall magnets'2004 6,723,214'Apparatus for improved power coupling through a workpiece in a semiconductor wafer processing system'2004 6,589,407'Aluminum deposition shield'2003 6,409,890'Method and apparatus for forming a uniform layer on a workpiece during sputtering'2002 6,406,599'Magnetron with a rotating center magnet for a vault shaped sputtering target'2002 6,254,746'Recessed coil for generating a plasma'2001 6,219,219'Cathode assembly containing an electrostatic chuck for retaining a wafer in a semiconductor wafer processing system'2001 6,162,297'Embossed semiconductor fabrication parts'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2021Patents assigned to APPLIED MATERIALS INC (63)· patent assignee history

2000–2021Based in San Jose, CA, US· patent location history

2012–2018Patents assigned to SUBRAMANI ANANTHA K (6)· patent assignee history

2012–2019Patents assigned to GOEL ASHISH (4)· patent assignee history

2013–2019Patents assigned to SUBRAMANI ANANTHA (6)· patent assignee history

2013–2019Patents assigned to EWERT MAURICE E (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
APPLIED MATERIALS INC	63	2000–2021
SUBRAMANI ANANTHAself	6	2013–2019
SUBRAMANI ANANTHA Kself	6	2012–2018
GOEL ASHISH	4	2012–2019
EWERT MAURICE E	3	2013–2019

Locations

Location	Patents	Span
San Jose, California, US	63	2000–2021