Inventor
David W. Minsek
Inventor
New Milford, CT, US
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices23%
C11DDetergent compositions17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
C23GCleaning or de-greasing of metallic material by chemical methods other than electrolysis8%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
C09GPolishing compositions4%
C09KMaterials for miscellaneous applications, not provided for elsewhere4%
C23CCoating metallic material4%
C25DProcesses for the electrolytic or electrophoretic production of coatings4%
H01LSemiconductor devices4%
PatentTitleYear
9,783,901'Electroplating of metals on conductive oxide substrates'20179,443,713'Oxidizing aqueous cleaner for the removal of post-etch residues'20169,422,513'Metal and dielectric compatible sacrificial anti-reflective coating cleaning and removal composition'20169,256,134'Photoresist removal'20168,956,687'Light induced plating of metals on silicon photovoltaic cells'20158,951,948'Metal and dielectric compatible sacrificial anti-reflective coating cleaning and removal composition'20158,765,654'Oxidizing aqueous cleaner for the removal of post-etch residues'20148,722,142'Light induced electroless plating'20148,679,734'Photoresist removal'20148,337,942'Light induced plating of metals on silicon photovoltaic cells'20128,338,087'Composition and process for post-etch removal of photoresist and/or sacrificial anti-reflective material deposited on a substrate'20128,236,485'Photoresist removal'20127,994,108'Composition useful for removal of post-etch photoresist and bottom anti-reflection coatings'20117,922,824'Oxidizing aqueous cleaner for the removal of post-etch residues'20117,326,673'Treatment of semiconductor substrates using long-chain organothiols or long-chain acetates'20087,119,052'Compositions and methods for high-efficiency cleaning/polishing of semiconductor wafers'20066,849,200'Composition and process for wet stripping removal of sacrificial anti-reflective material'20056,824,952'Deep-UV anti-reflective resist compositions'20046,773,873'pH buffered compositions useful for cleaning residue from semiconductor substrates'20046,716,568'Epoxy photoresist composition with improved cracking resistance'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2016Patents assigned to ADVANCED TECH MATERIALS (14)· patent assignee history
2004–2012Based in Pleasantville, NY, US· patent location history
2011–2017Based in New Milford, CT, US· patent location history
2012–2015Patents assigned to MINSEK DAVID W (5)· patent assignee history
2012–2015Patents assigned to BAUM THOMAS H (4)· patent assignee history
2012–2015Patents assigned to BERNHARD DAVID D (3)· patent assignee history
2012–2015Patents assigned to RATH MELISSA K (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ADVANCED TECH MATERIALS | 14 | 2004–2016 |
| MINSEK DAVID Wself | 5 | 2012–2015 |
| BAUM THOMAS H | 4 | 2012–2015 |
| BERNHARD DAVID D | 3 | 2012–2015 |
| RATH MELISSA K | 3 | 2012–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| New Milford, CT, US | 13 | 2011–2017 |
| Pleasantville, New York, US | 7 | 2004–2012 |