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Inventor

Toshihiko Tsuji

Inventor
Utsunomiya, JP

Overview

58→
Patents
1977–2016
Patent span
Physics
Primary field (CPC G)

Patents· 58 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices48%
G01NInvestigating or analysing materials by determining their chemical or physical properties10%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them9%
G02BOptical elements, systems or apparatus7%
B82YSpecific uses or applications of nanostructures3%
H04NPictorial communication, e.g. television3%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light2%
G21KHandling of particles or ionising radiation not otherwise provided for2%
H01FMagnets2%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h102%
PatentTitleYear
9,332,166'Imaging apparatus equipped with illumination optical system having a plurality of optical integrators that guide light'20169,329,376'Imaging apparatus'20168,891,062'Illumination optical system, exposure apparatus, and method of manufacturing device'20148,284,378'Illumination optical system and exposure apparatus'20128,035,668'Exposure apparatus and device manufacturing method'20117,714,987'Exposure apparatus'20107,538,856'Illumination optical system and exposure apparatus including the same'20097,324,187'Illumination system and exposure apparatus'20087,274,435'Exposure apparatus and device fabrication method using the same'20077,265,816'Illumination optical system, exposure apparatus, and device manufacturing method with modified illumination generator'20077,239,375'Illumination apparatus, exposure apparatus and device manufacturing method'20077,130,025'Illumination apparatus, exposure apparatus and device manufacturing method'20067,116,396'Exposure device, exposure method and device manufacturing method'20067,110,084'Illumination optical system and exposure apparatus'20067,106,414'Exposure system and method for manufacturing device'20067,064,806'Illumination optical system and exposure apparatus'20067,050,154'Illumination optical system in exposure apparatus'20066,946,666'Position detection device, apparatus using the same, exposure apparatus, and device manufacturing method using the same'20056,922,910'Exposure apparatus'20056,919,951'Illumination system, projection exposure apparatus and device manufacturing method'20056,903,799'Exposure method and exposure apparatus'20056,885,432'Projection exposure apparatus and device manufacturing method'20056,856,392'Optical element with alignment mark, and optical system having such optical element'20056,850,327'Inspection method and apparatus for projection optical systems'20056,816,234'Illumination optical system in exposure apparatus'20046,806,477'Position detection device, apparatus using the same, exposure apparatus, and device manufacturing method using the same'20046,753,943'Scanning exposure apparatus and device manufacturing method using the same'20046,606,195'Optical unit and optical instrument having the same'20036,603,532'Illuminance measurement apparatus, exposure apparatus, and exposure method'20036,549,277'Illuminance meter, illuminance measuring method and exposure apparatus'20036,542,222'Beam output control method, beam output apparatus and exposure system, and device manufacturing method using the exposure system'20036,525,817'Inspection method and apparatus for projection optical systems'20036,392,742'Illumination system and projection exposure apparatus'20026,285,855'Illumination system and exposure apparatus having the same'20016,211,947'Illuminance distribution measuring method, exposing method and device manufacturing method'20016,169,602'Inspection method and apparatus for projection optical systems'20016,151,122'Inspection method and apparatus for projection optical systems'20006,002,467'Exposure apparatus and method'19995,894,341'Exposure apparatus and method for measuring a quantity of light with temperature variations'19995,861,952'Optical inspection method and apparatus including intensity modulation of a light beam and detection of light scattered at an inspection position'19995,798,838'Projection exposure apparatus having function of detecting intensity distribution of spatial image, and method of detecting the same'19985,767,962'Inspection system and device manufacturing method using the same'19985,751,426'Positional deviation measuring device and method for measuring the positional deviation between a plurality of diffraction gratings formed on the same object'19985,742,386'Apparatus for detecting foreign matter on a substrate, and an exposure apparatus including the same'19985,652,657'Inspection system for original with pellicle'19975,591,985'Surface state inspecting system including a scanning optical system for scanning a surface to be inspected with a first light and for simultaneously scanning a diffraction grating with a second light'19975,585,918'Foreign particle inspecting system'19965,486,919'Inspection method and apparatus for inspecting a particle, if any, on a substrate having a pattern'19965,461,474'Inspection apparatus for detecting foreign matter on a surface to be inspected, and an exposure apparatus and a device manufacturing method using the same'19955,432,603'Optical heterodyne interference measuring apparatus and method, and exposing apparatus and device manufacturing method using the same, in which a phase difference between beat signals is detected'19955,424,552'Projection exposing apparatus'19955,270,794'Fine structure evaluation apparatus and method'19935,137,349'Projection-type optical apparatus'19924,390,209'Plastic seat-back framework and method for the manufacture thereof'19834,236,200'Semiconductor circuit having a series-connected reactor'19804,227,166'Reactor'19804,052,588'Electric heater panel'19774,021,843'Color tone control device in color television receiver'1977

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1977–1980Patents assigned to NIPPON KINZOKU CO LTD (3)· patent assignee history
1983Patents assigned to DELTA KOGYO CO (1)· patent assignee history
1992–2006Patents assigned to NIKON CORP (16)· patent assignee history
1993–2016Patents assigned to CANON KK (36)· patent assignee history
1993–1999Based in Atsugi, JP· patent location history
1996–2016Based in Utsunomiya, JP· patent location history
1999–2005Based in Chiba, JP· patent location history
2001–2006Based in Saitama, JP· patent location history
2006–2008Based in Tochigi, JP· patent location history
2012–2016Patents assigned to TSUJI TOSHIHIKO (4)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CANON KK361993–2016
NIKON CORP161992–2006
TSUJI TOSHIHIKOself42012–2016
NIPPON KINZOKU CO LTD31977–1980
DELTA KOGYO CO11983
Locations
LocationPatentsSpan
Utsunomiya, JP231996–2016
Tochigi, JP72006–2008
Chiba, JP61999–2005
Saitama, JP52001–2006
Atsugi, JP31993–1999