Inventor
Yasunobu Someya
Inventor
Toyama, JP
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices15%
H01LSemiconductor devices15%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
C09DCoating compositions, e.g. paints, varnishes or lacquers13%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds9%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds8%
C08LCompositions of macromolecular compounds4%
Y10TTechnical subjects covered by former us classification4%
B05DProcesses for applying fluent materials to surfaces, in general3%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients3%
PatentTitleYear
10,865,262Upper-layer film forming composition and method for producing a phase-separated pattern202010,804,111Method for roughening surface using wet treatment202010,508,181Bottom layer film-formation composition of self-organizing film containing polycyclic organic vinyl compound201910,295,907Resist underlayer film-forming composition for lithography containing polymer having acrylamide structure and acrylic acid ester structure201910,280,328Bottom layer film-forming composition of self-organizing film containing styrene structure20199,746,772'Resist underlayer film forming composition for lithography containing polyether structure-containing resin'20179,514,949'Composition for forming organic hard mask layer for use in lithography containing polymer having acrylamide structure'20169,469,777'Resist underlayer film forming composition that contains novolac resin having polynuclear phenol'20169,384,977'Method of manufacturing semiconductor device using organic underlayer film forming composition for solvent development lithography process'20169,343,324'Resist underlayer film-forming composition which contains alicyclic skeleton-containing carbazole resin'20169,263,285'Composition for forming a resist underlayer film including hydroxyl group-containing carbazole novolac resin'20169,263,286'Diarylamine novolac resin'20169,261,790'Resist underlayer film-forming composition containing copolymer resin having heterocyclic ring'20168,993,215'Resist underlayer film forming composition containing phenylindole-containing novolac resin'2015Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2015–2020Patents assigned to NISSAN CHEMICAL IND LTD (13)· patent assignee history
2015–2020Based in Toyama, JP· patent location history
2016Patents assigned to HASHIMOTO KEISUKE (3)· patent assignee history
2016Patents assigned to KARASAWA RYO (3)· patent assignee history
2016Patents assigned to SHINJO TETSUYA (3)· patent assignee history
2016Patents assigned to SOMEYA YASUNOBU (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NISSAN CHEMICAL IND LTD | 13 | 2015–2020 |
| HASHIMOTO KEISUKE | 3 | 2016 |
| KARASAWA RYO | 3 | 2016 |
| SHINJO TETSUYA | 3 | 2016 |
| SOMEYA YASUNOBUself | 3 | 2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Toyama, JP | 14 | 2015–2020 |