Inventor
Kuang-Hsiu Chen
Inventor
Tainan, TW
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices32%
H10DInorganic electric semiconductor devices32%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1028%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
PatentTitleYear
10,700,202Semiconductor device and method for forming the same202010,651,174FinFET structure and fabricating method of gate structure202010,505,041Semiconductor device having epitaxial layer with planar surface and protrusions201910,460,925Method for processing semiconductor device201910,340,268FinFET structure and fabricating method of gate structure201910,332,750Method for fabricating semiconductor device with strained silicon structure201910,332,741Method for post chemical mechanical polishing clean201910,312,084Semiconductor device and fabrication method thereof20199,966,266Apparatus for semiconductor wafer treatment and semiconductor wafer treatment20189,960,084Method for forming semiconductor device20189,899,520'Method for fabricating semiconductor device'20189,871,113'Semiconductor process'20189,793,105'Fabricating method of fin field effect transistor (FinFET)'20179,748,111'Method of fabricating semiconductor structure using planarization process and cleaning process'20179,646,889'Method of removing a hard mask layer on a gate structure while forming a protective layer on the surface of a substrate'20179,627,534'Semiconductor MOS device having a dense oxide film on a spacer'20179,613,808'Method of forming multilayer hard mask with treatment for removing impurities and forming dangling bonds'20179,502,244'Manufacturing method for forming semiconductor structure'20169,419,089'Semiconductor structure and manufacturing method thereof'2016Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2016–2020Patents assigned to UNITED MICROELECTRONICS CORP (19)· patent assignee history
2016–2020Based in Tainan, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| UNITED MICROELECTRONICS CORP | 19 | 2016–2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tainan, TW | 19 | 2016–2020 |