Inventor

Marc Wilhelmus Maria Van Der Wijst

Inventor

Veldhoven, NL

Overview

2004–2020

Patent span

Physics

Primary field (CPC G)

Patents· 42 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices62%

F16FSprings12%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%

G03BApparatus or arrangements for taking photographs or for projecting or viewing them4%

G01DMeasuring not specially adapted for a specific variable3%

G02BOptical elements, systems or apparatus3%

G10KSound-producing devices3%

B29CShaping or joining of plastics1%

B82YSpecific uses or applications of nanostructures1%

G05DSystems for controlling or regulating non-electric variables1%

PatentTitleYear

10,732,511Projection system and mirror and radiation source for a lithographic apparatus2020 10,649,347Lithographic apparatus and device manufacturing method2020 10,551,751Lithography apparatus and device manufacturing method2020 10,409,175Lithographic apparatus and device manufacturing method2019 10,216,093Projection system and minor and radiation source for a lithographic apparatus2019 10,191,393Lithographic apparatus, and device manufacturing method2019 10,146,133Lithographic apparatus and method2018 10,114,299Lithographic apparatus2018 9,715,171'Imprint lithographic apparatus and imprint lithographic method'2017 9,696,630'Lithographic apparatus and device manufacturing method'2017 9,494,869'Lithographic apparatus and device manufacturing method'2016 9,378,722'Lithographic apparatus with actuator to compensate acoustic vibration'2016 9,134,632'Lithographic apparatus and device manufacturing method'2015 9,122,173'Positioning system, lithographic apparatus and device manufacturing method'2015 8,994,919'Lithographic apparatus and device manufacturing method'2015 8,908,144'Lithographic apparatus and device manufacturing method'2014 8,781,775'Lithographic apparatus and method for correcting a position of a stage of a lithographic apparatus'2014 8,619,232'Method for damping an object, an active damping system, and a lithographic apparatus'2013 8,553,199'Lithographic apparatus and device manufacturing method'2013 8,493,553'Lithographic apparatus having a feed forward pressure pulse compensation for the metrology frame'2013 8,457,385'Measurement system and lithographic apparatus for measuring a position dependent signal of a movable object'2013 8,368,868'Lithographic apparatus with gas pressure means for controlling a planar position of a patterning device contactless'2013 8,245,824'Combination of structure and an active damping system, and a lithographic apparatus'2012 8,248,583'Lithographic apparatus and calibration method'2012 8,243,258'Lithographic apparatus having acoustic resonator'2012 8,203,694'Lithographic apparatus, projection assembly and active damping'2012 8,174,671'Lithographic projection apparatus and method for controlling a support structure'2012 8,164,737'Lithographic apparatus having an active damping subassembly'2012 8,144,310'Positioning system, lithographic apparatus and device manufacturing method'2012 8,059,259'Damping arrangement, active damping system, lithographic apparatus, and projection assembly'2011 7,999,914'Lithographic apparatus and device manufacturing method'2011 7,903,866'Measurement system, lithographic apparatus and method for measuring a position dependent signal of a movable object'2011 7,804,579'Control system, lithographic projection apparatus, method of controlling a support structure, and a computer program product'2010 7,804,584'Integrated circuit manufacturing methods with patterning device position determination'2010 7,554,105'Lithographic apparatus and device manufacturing method'2009 7,471,373'Lithographic apparatus with patterning device position determination'2008 7,436,484'Lithographic apparatus and device manufacturing method'2008 7,307,262'Lithographic apparatus and device manufacturing method'2007 7,116,399'Lithographic apparatus, device manufacturing method, and device manufactured thereby'2006 7,049,592'Lithographic apparatus and device manufacturing method'2006 6,977,713'Lithographic apparatus and device manufacturing method'2005 6,788,386'Lithographic apparatus and device manufacturing method'2004

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2004–2020Patents assigned to ASML NETHERLANDS BV (41)· patent assignee history

2004–2020Based in Veldhoven, NL· patent location history

2011–2017Patents assigned to VAN DER WIJST MARC WILHELMUS MARIA (20)· patent assignee history

2011–2017Patents assigned to BUTLER HANS (16)· patent assignee history

2011–2017Patents assigned to DE HOON CORNELIUS ADRIANUS LAMBERTUS (7)· patent assignee history

2011–2016Patents assigned to DE PEE JOOST (6)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
ASML NETHERLANDS BV	41	2004–2020
VAN DER WIJST MARC WILHELMUS MARIAself	20	2011–2017
BUTLER HANS	16	2011–2017
DE HOON CORNELIUS ADRIANUS LAMBERTUS	7	2011–2017
DE PEE JOOST	6	2011–2016

Locations

Location	Patents	Span
Veldhoven, NL	42	2004–2020