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Inventor

Jeffrey Scott Cites

Inventor
Horseheads, NY, US

Overview

15→
Patents
2004–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 15 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1026%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1023%
H10DInorganic electric semiconductor devices13%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form10%
C03CChemical composition of glasses, glazes or vitreous enamels10%
Y10TTechnical subjects covered by former us classification10%
B24BMachines, devices, or processes for grinding or polishing3%
F25DRefrigerators3%
H01PWaveguides3%
PatentTitleYear
10,864,707Glass/metal laminated structures and methods of manufacturing laminated structures202010,166,744Glass/metal laminated structures and methods of manufacturing laminated structures201910,144,198Strengthened glass and compositions therefor20189,339,993'Appliance fascia and mounting therefore'20168,772,875'Semiconductor on glass substrate with stiffening layer'20148,518,799'Process of making semiconductor on glass substrates with a stiffening layer'20138,357,974'Semiconductor on glass substrate with stiffening layer and process of making the same'20138,338,269'Methods and apparatus for producing semiconductor on insulator structures using directed exfoliation'20128,058,148'Methods and apparatus for producing semiconductor on insulator structures using directed exfoliation'20118,003,491'Methods and apparatus for producing semiconductor on insulator structures using directed exfoliation'20117,927,970'Producing SOI structure using high-purity ion shower'20117,816,225'Methods and apparatus for producing semiconductor on insulator structures using directed exfoliation'20107,608,521'Producing SOI structure using high-purity ion shower'20097,312,154'Method of polishing a semiconductor-on-insulator structure'20076,734,755'Broadband uniplanar coplanar transition'2004

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2004–2020Patents assigned to CORNING INC (15)· patent assignee history
2004–2020Based in Horseheads, NY, US· patent location history
2011–2016Patents assigned to CITES JEFFREY SCOTT (5)· patent assignee history
2011–2013Patents assigned to USENKO ALEX (4)· patent assignee history
2011–2012Patents assigned to CHEREKDJIAN SARKO (2)· patent assignee history
2013–2014Patents assigned to SOITEC SILICON ON INSULATOR (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CORNING INC152004–2020
CITES JEFFREY SCOTTself52011–2016
USENKO ALEX42011–2013
SOITEC SILICON ON INSULATOR32013–2014
CHEREKDJIAN SARKO22011–2012
Locations
LocationPatentsSpan
Horseheads, New York, US152004–2020