Inventor
Charles C. Garretson
Inventor
Sunnyvale, CA, US
Overview
Patents· 27 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B24Bprimary
B24BMachines, devices, or processes for grinding or polishing53%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
Y10TTechnical subjects covered by former us classification16%
H01LSemiconductor devices4%
B24DTools for grinding, buffing or sharpening2%
G01BMeasuring length, thickness or similar linear dimensions2%
PatentTitleYear
10,766,117Retaining ring with shaped surface202010,610,994Polishing system with local area rate control and oscillation mode202010,589,399Textured small pad for chemical mechanical polishing202010,434,623Local area polishing system and polishing pad assemblies for a polishing system201910,256,111Chemical mechanical polishing automated recipe generation201910,252,397Methods and apparatus for profile and surface preparation of retaining rings utilized in chemical mechanical polishing processes20199,937,601Retaining ring with Shaped Surface20189,242,337'Dynamic residue clearing control with in-situ profile control (ISPC)'20169,186,773'Retaining ring with shaped surface'20159,138,860'Closed-loop control for improved polishing pad profiles'20159,017,138'Retaining ring monitoring and control of pressure'20158,758,085'Method for compensation of variability in chemical mechanical polishing consumables'20148,755,927'Feedback for polishing rate correction in chemical mechanical polishing'20148,585,468'Retaining ring with shaped surface'20138,467,896'Feedback for polishing rate correction in chemical mechanical polishing'20138,337,279'Closed-loop control for effective pad conditioning'20128,190,285'Feedback for polishing rate correction in chemical mechanical polishing'20128,066,551'Retaining ring with shaped surface'20117,927,190'Retaining ring with shaped surface'20117,344,434'Retaining ring with shaped surface'20087,115,024'Profile control platen'20066,913,518'Profile control platen'20056,855,043'Carrier head with a modified flexible membrane'20056,855,031'Slurry flow rate monitoring in chemical-mechanical polisher using pressure transducer'20056,572,446'Chemical mechanical polishing pad conditioning element with discrete points and compliant membrane'20036,551,176'Pad conditioning disk'20036,220,941'Method of post CMP defect stability improvement'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001–2020Patents assigned to APPLIED MATERIALS INC (27)· patent assignee history
2001Based in San Francisco, CA, US· patent location history
2003–2018Based in San Jose, CA, US· patent location history
2003–2005Based in Palo Alto, CA, US· patent location history
2011–2015Patents assigned to GARRETSON CHARLES C (7)· patent assignee history
2011–2013Patents assigned to CHEN HUNG CHIH (3)· patent assignee history
2012–2015Patents assigned to DHANDAPANI SIVAKUMAR (5)· patent assignee history
2012–2015Patents assigned to MENK GREGORY E (3)· patent assignee history
2013–2020Based in Sunnyvale, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 27 | 2001–2020 |
| GARRETSON CHARLES Cself | 7 | 2011–2015 |
| DHANDAPANI SIVAKUMAR | 5 | 2012–2015 |
| CHEN HUNG CHIH | 3 | 2011–2013 |
| MENK GREGORY E | 3 | 2012–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Sunnyvale, California, US | 12 | 2013–2020 |
| San Jose, California, US | 12 | 2003–2018 |
| Palo Alto, California, US | 2 | 2003–2005 |
| San Francisco, California, US | 1 | 2001 |