Inventor

Mamoru Hatada

Inventor

Osaka, JP

Overview

2003

Patent span

General tagging of new technological developments

Primary field (CPC Y)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G01Nprimary

G01NInvestigating or analysing materials by determining their chemical or physical properties33%

Y02ATechnologies for adaptation to climate change33%

Y10TTechnical subjects covered by former us classification33%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2003Patents assigned to MIURA KOGYO KK (1)· patent assignee history

2003Patents assigned to OSAKA GAS CO LTD (1)· patent assignee history

2003Based in Osaka, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
MIURA KOGYO KK	1	2003
OSAKA GAS CO LTD	1	2003

Locations

Location	Patents	Span
Osaka, JP	1	2003