LexDanaLexDanabeta
Inventor

Naoyuki Satoh

Inventor
Nirasaki, JP

Overview

20→
Patents
1999–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 20 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps24%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
C23CCoating metallic material12%
G06FElectric digital data processing6%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices4%
G06QInformation and communication technology [ict] specially adapted for administrative, commercial, financial, managerial or supervisory purposes4%
G06TImage data processing or generation, in general4%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
Y10TTechnical subjects covered by former us classification4%
B81BMicrostructural devices or systems, e.g. micromechanical devices2%
PatentTitleYear
10,622,196Plasma processing apparatus202010,566,175Focus ring and plasma processing apparatus20209,818,583'Electrode plate for plasma etching and plasma etching apparatus'20179,812,297'Method of affixing heat transfer sheet'20179,117,635'Electrode plate for plasma etching and plasma etching apparatus'20158,715,782'Surface processing method'20148,475,622'Method of reusing a consumable part for use in a plasma processing apparatus'20138,318,034'Surface processing method'20128,221,579'Method of reusing a consumable part for use in a plasma processing apparatus'20128,175,419'Image search apparatus, image search method, and storage medium storing a program for causing a search apparatus to execute a search method'20128,149,239'Image processing apparatus, image processing method, and storage medium storing a program for causing an image processing apparatus to execute an image processing method'20128,135,240'Image searching device, method and recording medium'20127,867,926'Substrate processing apparatus and method'20117,862,959'Transfer mask for exposure and pattern exchanging method of the same'20117,641,806'Manufacturing method for membrane member'20107,473,567'Change rate prediction method, storage medium, and substrate processing system'20096,674,633'Process for producing a strontium ruthenium oxide protective layer on a top electrode'20046,229,545'Method of generating solid-shell object'20016,045,893'Multilayered electronic part with minimum silver diffusion'20005,999,975'On-line information providing scheme featuring function to dynamically account for user\'s interest'1999

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000Based in Tottori, JP· patent location history
2001–2004Based in Kanagawa, JP· patent location history
2009–2020Patents assigned to TOKYO ELECTRON LTD (13)· patent assignee history
2009–2017Based in Nirasaki, JP· patent location history
2012–2015Patents assigned to SATOH NAOYUKI (7)· patent assignee history
2012–2015Patents assigned to NAGAKUBO KEIICHI (4)· patent assignee history
2012–2015Patents assigned to NAGAYAMA NOBUYUKI (4)· patent assignee history
2012Patents assigned to RICOH CO LTD (3)· patent assignee history
2012Based in Yokohama, JP· patent location history
2017–2020Based in Miyagi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD132009–2020
SATOH NAOYUKIself72012–2015
NAGAKUBO KEIICHI42012–2015
NAGAYAMA NOBUYUKI42012–2015
RICOH CO LTD32012
Locations
LocationPatentsSpan
Nirasaki, JP102009–2017
Miyagi, JP32017–2020
Yokohama, JP32012
Kanagawa, JP22001–2004
Tottori, JP12000