Inventor
Kyuhee HAN
Inventor
KR
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices24%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1024%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1018%
H01JElectric discharge tubes or discharge lamps12%
H10BElectronic memory devices12%
C23CCoating metallic material6%
H10DInorganic electric semiconductor devices6%
PatentTitleYear
12,548,746Physical vapor deposition apparatus202611,862,514Integrated circuit device including air gaps and method of manufacturing the same202411,646,263Semiconductor device and method of manufacturing semiconductor device202311,515,201Integrated circuit device including air gaps and method of manufacturing the same202211,195,696Electron beam generator, plasma processing apparatus having the same and plasma processing method using the same2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to SAMSUNG ELECTRONICS CO LTD (5)· patent assignee history
2021–2026Based in KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 5 | 2021–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| KR | 5 | 2021–2026 |