Inventor
Lester A. Pederson
Inventor
San Jose, CA, US
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices67%
G11BInformation storage based on relative movement between record carrier and transducer17%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests17%
PatentTitleYear
5,432,047'Patterning process for bipolar optical storage medium'19954,464,460'Process for making an imaged oxygen-reactive ion etch barrier'19844,398,001'Terpolymer resist compositions'19834,289,573'Process for forming microcircuits'19814,074,031'Process for preparing electron beam resists'1978Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1978–1995Patents assigned to IBM (5)· patent assignee history
1978–1984Based in San Jose, CA, US· patent location history
1995Based in Clovis, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 5 | 1978–1995 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Jose, California, US | 4 | 1978–1984 |
| Clovis, California, US | 1 | 1995 |