Inventor

Yoshihiko Hibi

Inventor
Toyohashi, JP

Overview

2→
Patents
2004
Patent span
Performing operations
Primary field (CPC B)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B01Jprimary
B01JChemical or physical processes, e.g. catalysis or colloid chemistry14%
B82BNanostructures formed by manipulation of individual atoms, molecules, or limited collections of atoms or molecules as discrete units14%
B82YSpecific uses or applications of nanostructures14%
C01BNon-metallic elements14%
H01JElectric discharge tubes or discharge lamps14%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests14%
H05HPlasma technique7%
Y10TTechnical subjects covered by former us classification7%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2004Patents assigned to FUTABA DENSHI KOGYO KK (2)· patent assignee history
2004Patents assigned to TAKIKAWA HIROFUMI (2)· patent assignee history
2004Based in Toyohashi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
FUTABA DENSHI KOGYO KK22004
TAKIKAWA HIROFUMI22004
Locations
LocationPatentsSpan
Toyohashi, JP22004