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Inventor

Ronald J. Kovach

Inventor
Langhorne, PA, US

Overview

7→
Patents
1979–2020
Patent span
Physics
Primary field (CPC G)

Patents· 7 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G01Jprimary
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light50%
H01JElectric discharge tubes or discharge lamps13%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light13%
H01TSpark gaps13%
LOC0813%
PatentTitleYear
10,571,334System and method for selective resolution for concave grating spectrometer202010,386,232Compact spectroscopic optical instrument20195,889,588'Random wavelength access monochromator incorporating coaxial off-axis parabolic OAP reflectors'1999D0400770'Tire changing tool'19984,795,256'Dual-wavelength spectrophotometry system'19894,481,630'Spark gap switch'19844,159,510'High-intensity lamp having high pulse repetition rate and narrow pulse-width'1979

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1979Patents assigned to PHOTOCHEMICAL RES ASSOC INC (1)· patent assignee history
1979–1984Based in London, CA· patent location history
1984Patents assigned to PHOTOCHEMICAL RES ASS (1)· patent assignee history
1989–1999Patents assigned to PHOTON TECH INT (2)· patent assignee history
1989–1999Based in Langhorne, PA, US· patent location history
1998Patents assigned to KOVACH RONALD (1)· patent assignee history
1998Based in Las Vegas, NV, US· patent location history
2019–2020Patents assigned to HORIBA INSTR INC (2)· patent assignee history
2019Based in Langhome, PA, US· patent location history
2020Based in Edison, NJ, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HORIBA INSTR INC22019–2020
PHOTON TECH INT21989–1999
KOVACH RONALDself11998
PHOTOCHEMICAL RES ASS11984
PHOTOCHEMICAL RES ASSOC INC11979
Locations
LocationPatentsSpan
Langhorne, Pennsylvania, US21989–1999
London, CA21979–1984
Edison, New Jersey, US12020
Langhome, Pennsylvania, US12019
Las Vegas, NV, US11998