Inventor
Hisako Aoyama
Inventor
Yokohama, JP
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties18%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1018%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests18%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices12%
G06FElectric digital data processing6%
G06QInformation and communication technology [ict] specially adapted for administrative, commercial, financial, managerial or supervisory purposes6%
G06TImage data processing or generation, in general6%
G08BSignalling systems, e.g. personal calling systems6%
G11BInformation storage based on relative movement between record carrier and transducer6%
H04NPictorial communication, e.g. television6%
PatentTitleYear
11,080,977Management system, server, management device, and management method20218,097,169'Method for filtering chemical'20127,862,965'Method for detecting defects which originate from chemical solution and method of manufacturing semiconductor device'20117,075,098'Method of selecting pattern to be measured, pattern inspection method, manufacturing method of semiconductor device, program, and pattern inspection apparatus'20066,794,286'Process for fabricating a metal wiring and metal contact in a semicondutor device'20046,090,699'Method of making a semiconductor device'20006,060,368'Mask pattern correction method'20005,592,024'Semiconductor device having a wiring layer with a barrier layer'1997Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1997–2012Patents assigned to TOSHIBA KK (7)· patent assignee history
1997–2004Based in Kawasaki, JP· patent location history
2000–2012Based in Yokohama, JP· patent location history
2006Based in Kanagawa, JP· patent location history
2012Patents assigned to AOYAMA HISAKO (1)· patent assignee history
2012Patents assigned to KAWAMURA YOSHIHISA (1)· patent assignee history
2012Patents assigned to MUTOH DAIZO (1)· patent assignee history
2021Patents assigned to AOYAMA HIROSHI (1)· patent assignee history
2021Based in Akashi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOSHIBA KK | 7 | 1997–2012 |
| AOYAMA HIROSHIself | 1 | 2021 |
| AOYAMA HISAKOself | 1 | 2012 |
| KAWAMURA YOSHIHISA | 1 | 2012 |
| MUTOH DAIZO | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yokohama, JP | 3 | 2000–2012 |
| Kawasaki, JP | 3 | 1997–2004 |
| Akashi, JP | 1 | 2021 |
| Kanagawa, JP | 1 | 2006 |