Inventor
Eiichiro Shiba
Inventor
Tama, JP
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
C23CCoating metallic material17%
H01JElectric discharge tubes or discharge lamps17%
H10DInorganic electric semiconductor devices8%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
PatentTitleYear
10,720,322Method for forming silicon nitride film selectively on top surface202010,529,554Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches20209,711,345'Method for forming aluminum nitride-based film by PEALD'20179,447,498'Method for performing uniform processing in gas system-sharing multiple reaction chambers'2016Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2016–2020Patents assigned to ASM IP HOLDING BV (4)· patent assignee history
2016–2020Based in Tama, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASM IP HOLDING BV | 4 | 2016–2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tama, JP | 4 | 2016–2020 |