Inventor
Lee Chen
Inventor
Cedar Creek, TX, US
Overview
Patents· 90 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps34%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
H01LSemiconductor devices9%
H05HPlasma technique9%
C23CCoating metallic material5%
Y10TTechnical subjects covered by former us classification4%
C23FNon-mechanical removal of metallic material from surface3%
H10DInorganic electric semiconductor devices3%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h101%
B05DProcesses for applying fluent materials to surfaces, in general1%
PatentTitleYear
10,796,916Microwave plasma device202010,734,200Mono-energetic neutral beam activated chemical processing system and method of using202010,395,903Self-sustained non-ambipolar direct current (DC) plasma at low power201910,388,528Non-ambipolar electric pressure plasma uniformity control201910,375,812Low electron temperature, edge-density enhanced, surface-wave plasma (SWP) processing method and apparatus201910,354,841Plasma generation and control using a DC ring201910,147,613Neutral beam etching of Cu-containing layers in an organic compound gas environment201810,002,744System and method for controlling plasma density20189,978,568Self-sustained non-ambipolar direct current (DC) plasma at low power20189,966,239Non-ambipolar plasma enhanced DC/VHF phasor20189,947,515Microwave surface-wave plasma device20189,941,126Microwave plasma device20189,934,974Microwave plasma device20189,852,893Dipole ring magnet assisted microwave radial line slot antenna plasma processing method and apparatus20179,799,494'Energetic negative ion impact ionization plasma'20179,793,095'Microwave surface-wave plasma device'20179,728,416'Plasma tuning rods in microwave resonator plasma sources'20179,697,993'Non-ambipolar plasma ehncanced DC/VHF phasor'20179,668,332'Method and apparatus for providing an anisotropic and mono-energetic neutral beam by non-ambipolar electron plasma'20179,530,621'Integrated induction coil and microwave antenna as an all-planar source'20169,520,275'Mono-energetic neutral beam activated chemical processing system and method of using'20169,455,133'Hollow cathode device and method for using the device to control the uniformity of a plasma process'20169,431,218'Scalable and uniformity controllable diffusion plasma source'20169,396,955'Plasma tuning rods in microwave resonator processing systems'20169,396,900'Radio frequency (RF) power coupling system utilizing multiple RF power coupling elements for control of plasma properties'20169,301,383'Low electron temperature, edge-density enhanced, surface wave plasma (SWP) processing method and apparatus'20169,290,848'Anisotropic etch of copper using passivation'20169,288,890'Method and apparatus for providing an anisotropic and mono-energetic neutral beam by non-ambipolar electron plasma'20169,209,032'Electric pressure systems for control of plasma properties and uniformity'20159,151,286'Processing chamber integrated pressure control'20159,111,873'Low profile magnetic filter'20159,111,727'Plasma tuning rods in microwave resonator plasma sources'20159,087,677'Methods of electrical signaling in an ion energy analyzer'20158,968,588'Low electron temperature microwave surface-wave plasma (SWP) processing method and apparatus'20158,883,024'Using vacuum ultra-violet (VUV) data in radio frequency (RF) sources'20148,877,080'Using vacuum ultra-violet (VUV) data in microwave sources'20148,847,159'Ion energy analyzer'20148,816,281'Ion energy analyzer and methods of manufacturing the same'20148,808,496'Plasma tuning rods in microwave processing systems'20148,747,610'Plasma source pumping and gas injection baffle'20148,721,833'Variable capacitance chamber component incorporating ferroelectric materials and methods of manufacturing and using thereof'20148,669,705'Stable surface wave plasma source'20148,501,499'Adaptive recipe selector'20138,486,798'Variable capacitance chamber component incorporating a semiconductor junction and methods of manufacturing and using thereof'20138,460,567'Method and system for etching a MEM device'20138,415,884'Stable surface wave plasma source'20138,409,459'Hollow cathode device and method for using the device to control the uniformity of a plasma process'20138,343,371'Apparatus and method for improving photoresist properties using a quasi-neutral beam'20138,323,521'Plasma generation controlled by gravity-induced gas-diffusion separation (GIGDS) techniques'20128,276,540'Method and system for introducing process fluid through a chamber component'20128,100,082'Method and system for introducing process fluid through a chamber component'20128,083,961'Method and system for controlling the uniformity of a ballistic electron beam by RF modulation'20118,038,834'Method and system for controlling radical distribution'20117,998,307'Electron beam enhanced surface wave plasma source'20117,993,937'DC and RF hybrid processing system'20117,988,813'Dynamic control of process chemistry for improved within-substrate process uniformity'20117,939,450'Method and apparatus for spacer-optimization (S-O)'20117,938,081'Radial line slot antenna having a conductive layer'20117,899,637'Method and apparatus for creating a gate optimization evaluation library'20117,875,859'Ion energy analyzer and methods of manufacturing and operating'20117,875,555'Method for plasma processing over wide pressure range'20117,829,469'Method and system for uniformity control in ballistic electron beam enhanced plasma processing system'20107,781,340'Method and system for etching high-k dielectric materials'20107,777,179'Two-grid ion energy analyzer and methods of manufacturing and operating'20107,772,544'Neutral beam source and method for plasma heating'20107,765,077'Method and apparatus for creating a Spacer-Optimization (S-O) library'20107,754,615'Method and apparatus for detecting endpoint in a dry etching system by monitoring a superimposed DC current'20107,744,720'Suppressor of hollow cathode discharge in a shower head fluid distribution system'20107,732,759'Multi-plasma neutral beam source and method of operating'20107,718,030'Method and system for controlling radical distribution'20107,713,758'Method and apparatus for optimizing a gate channel'20107,709,397'Method and system for etching a high-k dielectric material'20107,674,636'Dynamic temperature backside gas control for improved within-substrate process uniformity'20107,642,193'Method of treating a mask layer prior to performing an etching process'20107,638,759'Hyperthermal neutral beam source and method of operating'20097,584,714'Method and system for improving coupling between a surface wave plasma source and a plasma space'20097,572,386'Method of treating a mask layer prior to performing an etching process'20097,553,427'Plasma etching of Cu-containing layers'20097,449,414'Method of treating a mask layer prior to performing an etching process'20087,396,431'Plasma processing system for treating a substrate'20087,361,608'Method and system for forming a feature in a high-k layer'20087,358,484'Hyperthermal neutral beam source and method of operating'20087,268,084'Method for treating a substrate'20077,229,563'Plasma etching of Ni-containing materials'20077,214,327'Anisotropic dry etching of Cu-containing layers'20077,202,169'Method and system for etching high-k dielectric materials'20077,138,767'Surface wave plasma processing system and method of using'20066,852,584'Method of trimming a gate electrode structure'20056,809,310'Accelerated ion beam generator'20046,512,333'RF-powered plasma accelerator/homogenizer'2003Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2003–2013Based in Austin, TX, US· patent location history
2005–2020Patents assigned to TOKYO ELECTRON LTD (87)· patent assignee history
2006–2020Based in Cedar Creek, TX, US· patent location history
2007Based in Ceder Creek, TX, US· patent location history
2011–2019Patents assigned to CHEN LEE (24)· patent assignee history
2012–2019Patents assigned to FUNK MERRITT (17)· patent assignee history
2012–2015Patents assigned to ZHAO JIANPING (12)· patent assignee history
2013–2015Patents assigned to SUNDARARAJAN RADHA (8)· patent assignee history
2018Based in Cedar Park, TX, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 87 | 2005–2020 |
| CHEN LEEself | 24 | 2011–2019 |
| FUNK MERRITT | 17 | 2012–2019 |
| ZHAO JIANPING | 12 | 2012–2015 |
| SUNDARARAJAN RADHA | 8 | 2013–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Cedar Creek, Texas, US | 81 | 2006–2020 |
| Austin, Texas, US | 7 | 2003–2013 |
| Cedar Park, Texas, US | 1 | 2018 |
| Ceder Creek, Texas, US | 1 | 2007 |