Inventor

Masao Kosugi

Inventor

Yokohama, JP

Overview

36→

Patents

1978–2000

Patent span

Physics

Primary field (CPC G)

Patents· 36 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices59%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%

H10DInorganic electric semiconductor devices6%

G02BOptical elements, systems or apparatus4%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%

B41JTypewriters2%

G03BApparatus or arrangements for taking photographs or for projecting or viewing them2%

H02NElectric machines not otherwise provided for2%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h102%

Y10TTechnical subjects covered by former us classification2%

PatentTitleYear

6,144,504'Projection and exposure apparatus including an optical member and a holding member'2000 5,999,270'Projection exposure apparatus and microdevice manufacturing method using the same'1999 5,386,269'Alignment and exposure apparatus'1995 5,365,342'Alignment and exposure apparatus and method for manufacture of integrated circuits'1994 5,262,822'Exposure method and apparatus'1993 5,160,957'Alignment and exposure apparatus'1992 5,137,363'Projection exposure apparatus'1992 5,120,134'Exposure system including a device for analyzing an affect of a wafer resist upon a mark signal'1992 5,053,670'Precision actuator'1991 5,050,111'Alignment and exposure apparatus and method for manufacture of integrated circuits'1991 4,937,618'Alignment and exposure apparatus and method for manufacture of integrated circuits'1990 4,910,679'Step-and-repeat alignment and exposure method and apparatus'1990 4,888,614'Observation system for a projection exposure apparatus'1989 4,843,563'Step-and-repeat alignment and exposure method and apparatus'1989 4,823,012'Step and repeat exposure apparatus having improved system for aligning'1989 4,814,829'Projection exposure apparatus'1989 4,786,947'Projection exposure apparatus'1988 4,776,462'Container for a sheet-like article'1988 4,775,877'Method and apparatus for processing a plate-like workpiece'1988 4,757,355'Mask storing mechanism'1988 4,719,357'Semiconductor circuit manufacturing apparatus having selectively operable detectors for effecting automatic alignment'1988 4,682,037'Projection exposure apparatus having an alignment light of a wavelength other than that of the exposure light'1987 4,676,631'Device for adjusting projection magnification'1987 4,648,708'Pattern transfer apparatus'1987 4,627,010'Method and device for discriminating stillness of a step exposure apparatus'1986 4,617,469'Exposure apparatus with detecting means insertable into an exposure path'1986 4,530,587'Step type mask aligner'1985 4,521,082'Exposure apparatus'1985 4,506,977'Transfer apparatus provided with an auto-focusing mechanism'1985 4,488,806'Shot arranging method in a divisional printing apparatus'1984 4,479,711'Mask aligner'1984 4,441,853'Disc orienting device'1984 4,271,577'Alignment device'1981 4,179,794'Process of manufacturing semiconductor devices'1979 4,179,110'Method for opposing a sheet-like material to a standard plane with predetermined space therebetween'1979 4,106,044'Field effect transistor having unsaturated characteristics'1978

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1978–1979Patents assigned to NIPPON MUSICAL INSTRUMENTS MFG (2)· patent assignee history

1978Based in Hamakita, JP· patent location history

1979–2000Patents assigned to CANON KK (34)· patent assignee history

1979Based in Hamamatsu, JP· patent location history

1979Based in Kawasaki, JP· patent location history

1981–2000Based in Yokohama, JP· patent location history

1993Based in Kanagawa, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
CANON KK	34	1979–2000
NIPPON MUSICAL INSTRUMENTS MFG	2	1978–1979

Locations

Location	Patents	Span
Yokohama, JP	32	1981–2000
Kanagawa, JP	1	1993
Hamamatsu, JP	1	1979
Kawasaki, JP	1	1979
Hamakita, JP	1	1978