Inventor
Kosaburo Matsumura
Inventor
Tokuyama, JP
Overview
Patents· 2 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C08Lprimary
C08LCompositions of macromolecular compounds17%
C09DCoating compositions, e.g. paints, varnishes or lacquers17%
G03CPhotosensitive materials for photographic purposes17%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices17%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests17%
Y10TTechnical subjects covered by former us classification17%
PatentTitleYear
5,677,380'Planarizing material and planarizing method'19975,212,043'Photoresist composition comprising a non-aromatic resin having no aromatic structures derived from units of an aliphatic cyclic hydrocarbon and units of maleic anhydride and/or maleimide and a photosensitive agent'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1993–1997Patents assigned to TOSOH CORP (2)· patent assignee history
1993Based in Yokohama, JP· patent location history
1997Based in Tokuyama, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOSOH CORP | 2 | 1993–1997 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokuyama, JP | 1 | 1997 |
| Yokohama, JP | 1 | 1993 |