Inventor

Tomohisa Kawabata

Inventor
Amagasaki, JP

Overview

10→
Patents
1996–2020
Patent span
Chemistry
Primary field (CPC C)

Patents· 10 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties18%
C12QMeasuring or testing processes involving enzymes, nucleic acids or microorganisms12%
B01FMixing, e.g. dissolving, emulsifying or dispersing9%
C12NMicroorganisms or enzymes9%
A61PSpecific therapeutic activity of chemical compounds or medicinal preparations6%
B01LChemical or physical laboratory apparatus for general use6%
B03CMagnetic or electrostatic separation of solid materials from solid materials or fluids6%
C12MApparatus for enzymology or microbiology6%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
Y10TTechnical subjects covered by former us classification6%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1996–2016Patents assigned to WAKO PURE CHEM IND LTD (8)· patent assignee history
1996–2020Based in Amagasaki, JP· patent location history
2000–2003Based in Osaka, JP· patent location history
2003Patents assigned to EISAI CO LTD (1)· patent assignee history
2010–2016Based in Hyogo, JP· patent location history
2010Based in Tokyo, JP· patent location history
2016Patents assigned to KAWABATA TOMOHISA (1)· patent assignee history
2020Patents assigned to FUJIFILM TECHNO PRODUCTS CO LTD (1)· patent assignee history
2020Patents assigned to FUJIFILM WAKO PURE CHEMICAL CORP (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
WAKO PURE CHEM IND LTD81996–2016
EISAI CO LTD12003
FUJIFILM TECHNO PRODUCTS CO LTD12020
FUJIFILM WAKO PURE CHEMICAL CORP12020
KAWABATA TOMOHISAself12016
Locations
LocationPatentsSpan
Amagasaki, JP41996–2020
Hyogo, JP32010–2016
Osaka, JP22000–2003
Tokyo, JP12010