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Inventor

Osamu Ariyada

Inventor
Tokyo, JP

Overview

2→
Patents
2017–2018
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material29%
C30BSingle-crystal growth14%
G01NInvestigating or analysing materials by determining their chemical or physical properties14%
G06FElectric digital data processing14%
H01JElectric discharge tubes or discharge lamps14%
H05HPlasma technique14%
PatentTitleYear
10,151,033Plasma chemical vapor deposition device20189,658,191'Atomic flux measurement device'2017

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2017Patents assigned to ARIOS INC (1)· patent assignee history
2017Patents assigned to THE DOSHISHA (1)· patent assignee history
2017–2018Based in Tokyo, JP· patent location history
2018Patents assigned to TOYOTA MOTOR CO LTD (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ARIOS INC12017
THE DOSHISHA12017
TOYOTA MOTOR CO LTD12018
Locations
LocationPatentsSpan
Tokyo, JP22017–2018