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Inventor

Shigehiro MIURA

Inventor
JP

Overview

4→
Patents
2022
Patent span
Electricity
Primary field (CPC H)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material29%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
H01JElectric discharge tubes or discharge lamps21%
H01LSemiconductor devices21%
PatentTitleYear
11,479,852Method for dry cleaning a susceptor and substrate processing apparatus202211,390,948Film forming apparatus202211,328,901Deposition method202211,274,372Film deposition apparatus2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022Patents assigned to TOKYO ELECTRON LTD (4)· patent assignee history
2022Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD42022
Locations
LocationPatentsSpan
JP42022