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Inventor

Akio Nishikata

Inventor
Kitamoto, JP

Overview

2→
Patents
2001–2003
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices67%
G06KGraphical data reading33%
PatentTitleYear
6,523,748'Substrate for exposure, readout method and apparatus for the substrate, exposure apparatus, and method for producing semiconductor devices using the exposure apparatus'20036,184,970'Master plate transporting system'2001

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001–2003Patents assigned to NIKON CORP (2)· patent assignee history
2001Based in Yokohama, JP· patent location history
2003Based in Kitamoto, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NIKON CORP22001–2003
Locations
LocationPatentsSpan
Kitamoto, JP12003
Yokohama, JP12001