Inventor

Heiko Froehlich

Inventor
Radebeul, DE

Overview

22→
Patents
2015–2021
Patent span
Performing operations
Primary field (CPC B)

Patents· 22 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B81Cprimary
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems22%
B81BMicrostructural devices or systems, e.g. micromechanical devices20%
H01LSemiconductor devices14%
G01LMeasuring force, stress, torque, work, mechanical power, mechanical efficiency, or fluid pressure8%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light5%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation5%
H10NElectric solid-state devices not otherwise provided for5%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
H03HImpedance networks, e.g. resonant circuits3%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%
PatentTitleYear
11,078,072Microelectromechanical device, method for manufacturing a microelectromechanical device, and method for manufacturing a system on chip using a CMOS process202111,015,980Infrared radiation sensors and methods of manufacturing infrared radiation sensors202110,870,575Stressed decoupled micro-electro-mechanical system sensor202010,683,203Microelectromechanical device, method for manufacturing a microelectromechanical device, and method for manufacturing a system on chip using a CMOS process202010,684,306Capacitive microelectromechanical device and method for forming a capacitive microelectromechanical device202010,681,777Light emitter devices, optical filter structures and methods for forming light emitter devices and optical filter structures202010,544,037Integrated semiconductor device and manufacturing method202010,386,255Pressure sensor device and manufacturing method201910,347,778Graded-index structure for optical systems201910,290,805Emitter and method for manufacturing the same201910,084,101Graded-index structure for optical systems201810,060,816Sensor structures, systems and methods with improved integration and optimized footprint20189,938,133System and method for a comb-drive MEMS device20189,896,329'Integrated semiconductor device and manufacturing method'20189,887,355'Emitter and method for manufacturing the same'20189,752,943'Sensor structures, systems and methods with improved integration and optimized footprint'20179,663,355'Method and structure for creating cavities with extreme aspect ratios'20179,641,153'Method of forming a resonator'20179,452,923'Method for manufacturing a micromechanical system comprising a removal of sacrificial material through a hole in a margin region'20169,382,111'Micromechanical system and method for manufacturing a micromechanical system'20169,376,314'Method for manufacturing a micromechanical system'20169,209,778'Microelectromechanical resonators'2015

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2015–2020Patents assigned to INFINEON TECHNOLOGIES DRESDEN GMBH (15)· patent assignee history
2015–2021Based in Radebeul, DE· patent location history
2018–2021Patents assigned to INFINEON TECHNOLOGIES AG (6)· patent assignee history
2018Patents assigned to INFINEON TECH DESDEN GMBH (1)· patent assignee history
2020–2021Patents assigned to INFINEON TECH DRESDEN GMBH & CO KG (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
INFINEON TECHNOLOGIES DRESDEN GMBH152015–2020
INFINEON TECHNOLOGIES AG62018–2021
INFINEON TECH DRESDEN GMBH & CO KG22020–2021
INFINEON TECH DESDEN GMBH12018
Locations
LocationPatentsSpan
Radebeul, DE222015–2021