Inventor
William J. Baggenstoss
Inventor
Boise, ID, US
Overview
Patents· 10 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices80%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation20%
PatentTitleYear
8,101,454'Method of forming pixel cell having a grated interface'20127,880,255'Pixel cell having a grated interface'20117,229,724'Reticles and methods of forming and using the same'20077,105,278'Pattern mask with features to minimize the effect of aberrations'20066,854,106'Reticles and methods of forming and using the same'20056,803,157'Pattern mask with features to minimize the effect of aberrations'20046,401,236'Method to eliminate side lobe printing of attenuated phase shift'20026,319,644'Methods of reducing proximity effects in lithographic processes'20016,284,419'Methods of reducing proximity effects in lithographic processes'20016,120,952'Methods of reducing proximity effects in lithographic processes'2000Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2000–2012Patents assigned to MICRON TECHNOLOGY INC (10)· patent assignee history
2000–2012Based in Boise, ID, US· patent location history
2012Patents assigned to BAGGENSTOSS WILLIAM J (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MICRON TECHNOLOGY INC | 10 | 2000–2012 |
| BAGGENSTOSS WILLIAM Jself | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Boise, ID, US | 10 | 2000–2012 |