Inventor
Jui-Cheng Lo
Inventor
Hsinchu, TW
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
B24BMachines, devices, or processes for grinding or polishing17%
F04BPositive-displacement machines for liquids17%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices17%
PatentTitleYear
7,125,521'Method to solve alignment mark blinded issues and technology for application of semiconductor etching at a tiny area'20066,926,584'Dual mode hybrid control and method for CMP slurry'20056,860,723'Slurry flow control and monitor system for chemical mechanical polisher'20055,726,102'Method for controlling etch bias in plasma etch patterning of integrated circuit layers'19985,667,630'Low charge-up reactive ion metal etch process'1997Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1997–1998Patents assigned to VANGUARD INT SEMICONDUCT CORP (2)· patent assignee history
1997–2006Based in Hsinchu, TW· patent location history
2005–2006Patents assigned to TAIWAN SEMICONDUCTOR MFG (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG | 3 | 2005–2006 |
| VANGUARD INT SEMICONDUCT CORP | 2 | 1997–1998 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hsinchu, TW | 5 | 1997–2006 |