Inventor

Yoko Oikawa

Inventor

Kyoto-shi, JP

Overview

3→

Patents

1982–2021

Patent span

Physics

Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B01Dprimary

B01DSeparation13%

B01JChemical or physical processes, e.g. catalysis or colloid chemistry13%

C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium13%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices13%

G06FElectric digital data processing13%

G11BInformation storage based on relative movement between record carrier and transducer13%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests13%

Y10TTechnical subjects covered by former us classification13%

PatentTitleYear

11,090,631Method for hydrophobization of hydrophilic material2021 7,890,908'Method for verifying mask pattern data, method for manufacturing mask, mask pattern verification program, and method for manufacturing semiconductor device'2011 4,335,198'Process for recording'1982

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1982Patents assigned to CANON KK (1)· patent assignee history

1982Based in Kawasaki, JP· patent location history

2011Patents assigned to TOSHIBA KK (1)· patent assignee history

2011Based in Tokyo, JP· patent location history

2021Patents assigned to SHIMADZU CORP (1)· patent assignee history

2021Based in Kyoto-shi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
CANON KK	1	1982
SHIMADZU CORP	1	2021
TOSHIBA KK	1	2011

Locations

Location	Patents	Span
Kyoto-shi, JP	1	2021
Tokyo, JP	1	2011
Kawasaki, JP	1	1982