Inventor

Gentaro Goshi

Inventor

Kumamoto, JP

Overview

2007–2021

Patent span

Electricity

Primary field (CPC H)

Patents· 17 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%

H01LSemiconductor devices27%

B08BCleaning in general18%

C11DDetergent compositions6%

F26BDrying solid materials or objects by removing liquid therefrom6%

F04DNon-positive-displacement pumps4%

B01JChemical or physical processes, e.g. catalysis or colloid chemistry2%

B05CApparatus for applying fluent materials to surfaces, in general2%

B05DProcesses for applying fluent materials to surfaces, in general2%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices2%

PatentTitleYear

11,133,176Substrate processing method, recording medium and substrate processing system2021 10,998,186Substrate processing apparatus, substrate processing method, and storage medium2021 10,950,465Method of cleaning substrate processing apparatus and system of cleaning substrate processing apparatus2021 10,770,316Substrate liquid processing apparatus, substrate liquid processing method and recording medium2020 10,692,739Substrate processing apparatus2020 10,619,922Substrate processing apparatus, substrate processing method, and storage medium2020 10,576,493Substrate processing apparatus and substrate processing method2020 10,566,182Substrate processing apparatus, substrate processing method, and storage medium2020 10,504,718Substrate processing apparatus, substrate processing method, and storage medium2019 10,395,950Substrate processing apparatus, substrate processing method, and recording medium2019 10,062,586Chemical fluid processing apparatus and chemical fluid processing method2018 10,046,370Substrate processing apparatus, substrate processing method, fluid supplying method and storage medium2018 9,865,483'Substrate liquid processing method, substrate liquid processing apparatus, and recording medium'2018 9,662,685'Substrate processing apparatus, substrate processing method, fluid supplying method and storage medium'2017 7,491,036'Method and system for cooling a pump'2009 7,211,145'Substrate processing apparatus and substrate processing method'2007 7,186,093'Method and apparatus for cooling motor bearings of a high pressure pump'2007

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2007–2021Patents assigned to TOKYO ELECTRON LTD (17)· patent assignee history

2007Based in Tosu, JP· patent location history

2007Based in Phoenix, AZ, US· patent location history

2009Based in Phoeniz, AZ, US· patent location history

2017–2021Based in Kumamoto, JP· patent location history

2020–2021Based in Koshi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
TOKYO ELECTRON LTD	17	2007–2021

Locations

Location	Patents	Span
Kumamoto, JP	12	2017–2021
Koshi, JP	2	2020–2021
Phoeniz, AZ, US	1	2009
Tosu, JP	1	2007
Phoenix, AZ, US	1	2007