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Inventor

Colleen Lawlor

Inventor
Clinton, NY, US

Overview

2→
Patents
2019–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material25%
H01LSemiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1025%
PatentTitleYear
10,825,679Selective growth of SIO2 on dielectric surfaces in the presence of copper202010,460,930Selective growth of SiO2 on dielectric surfaces in the presence of copper2019

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2019–2020Patents assigned to LAM RES CORP (2)· patent assignee history
2019–2020Based in Clinton, NY, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
LAM RES CORP22019–2020
Locations
LocationPatentsSpan
Clinton, New York, US22019–2020