Inventor

Akira Nishiya

Inventor

Kikuchi-gun, JP

Overview

1998–2014

Patent span

Electricity

Primary field (CPC H)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1035%

B23KSoldering or unsoldering22%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices13%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests9%

B01DSeparation4%

B01JChemical or physical processes, e.g. catalysis or colloid chemistry4%

B05DProcesses for applying fluent materials to surfaces, in general4%

G03DApparatus for processing exposed photographic materials4%

H01LSemiconductor devices4%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

1998Based in Kumagaya, JP· patent location history

2001–2014Patents assigned to TOKYO ELECTRON LTD (10)· patent assignee history

2001–2004Based in Kumamoto, JP· patent location history

2009–2010Based in Kikuchi-gun, JP· patent location history

2009–2012Based in Suwa, JP· patent location history

2011–2014Based in Koshi, JP· patent location history

2012–2014Patents assigned to NISHIYA AKIRA (2)· patent assignee history

2012Patents assigned to KOGA NORIHISA (1)· patent assignee history

2012Patents assigned to KOGA SHINJI (1)· patent assignee history

2014Patents assigned to OTSUKA TAKAHISA (1)· patent assignee history

Assignee and location history derived from the patent record.

Assignees

Locations