Inventor
Makoto Nomura
Inventor
Tokyo, JP
Overview
Patents· 30 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
F16Hprimary
F16HGearing8%
Y10TTechnical subjects covered by former us classification8%
B21KMaking forged or pressed metal products, e.g. horse-shoes, rivets, bolts or wheels6%
B62DMotor vehicles6%
B21JForging5%
B60NSeats specially adapted for vehicles5%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%
LOC065%
LOC235%
C07CAcyclic or carbocyclic compounds3%
PatentTitleYear
10,562,138Method for manufacturing rack bar202010,259,355Vehicle seat201910,239,428Vehicle seat2019D0828499Electromagnetic valve2018D0828498Electromagnetic valve201810,060,518Rack bar and rack bar teeth forming die201810,011,206Vehicle seat with detachable cap for anchor storage recess20189,920,826'Hollow rack bar and method of manufacturing hollow rack bar'2018D0794986'Vehicle seat'2017D0792727'Vehicle seat'2017D0792728'Vehicle seat'20179,328,815'Rack bar and rack bar teeth forming die'20169,316,294'Rack bar and rack bar teeth forming die'20168,972,036'Method of controlling substrate processing apparatus, maintenance method of substrate processing apparatus and transfer method performed in substrate processing apparatus'20158,904,955'Substrate processing apparatus'2014D0715899'Electromagnetic valve'20148,588,950'Substrate processing apparatus'20138,277,640'Thermal cracking process and facility for heavy petroleum oil'20128,262,903'Process, reactor and facility for thermally cracking heavy petroleum oil'20127,195,855'Negative-type photosensitive resin composition containing epoxy compound'20077,195,858'Negative type photosensitive resin composition containing a phenol-biphenylene resin'20076,899,756'Drier for printing ink and printing ink containing drier'20056,675,830'Valve unit capable of monitoring output pressure'20046,598,411'Vehicle air conditioning heat exchanger seal'20036,512,148'Process for the production of bisphenol A'20036,453,981'Composite core for casting'20026,314,798'Cutting tool and wear resistant material'20015,371,302'Process for preparing prilled bisphenol A'19944,914,948'Apparatus for monitoring burden distribution in furnace'19904,697,453'Apparatus for monitoring burden distribution in furnace'1987Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994–2012Based in Yokohama, JP· patent location history
2004–2018Patents assigned to SMC CORP (4)· patent assignee history
2005–2020Based in Tokyo, JP· patent location history
2012–2014Patents assigned to NOMURA MAKOTO (5)· patent assignee history
2013–2015Patents assigned to HITACHI INT ELECTRIC INC (3)· patent assignee history
2013–2015Based in Toyama, JP· patent location history
2016–2020Patents assigned to NETUREN CO LTD (5)· patent assignee history
2017–2019Patents assigned to TACHI S CO (6)· patent assignee history
2017Based in Ome, JP· patent location history
2018Based in Moriya, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TACHI S CO | 6 | 2017–2019 |
| NETUREN CO LTD | 5 | 2016–2020 |
| NOMURA MAKOTOself | 5 | 2012–2014 |
| SMC CORP | 4 | 2004–2018 |
| HITACHI INT ELECTRIC INC | 3 | 2013–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 9 | 2005–2020 |
| Yokohama, JP | 4 | 1994–2012 |
| Ome, JP | 3 | 2017 |
| Toyama, JP | 3 | 2013–2015 |
| Moriya, JP | 2 | 2018 |