Inventor
Daniel P. Sanders
Inventor
San Jose, CA, US
Overview
Patents· 84 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices18%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds9%
C07DHeterocyclic compounds6%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
C08LCompositions of macromolecular compounds6%
C09DCoating compositions, e.g. paints, varnishes or lacquers6%
B82YSpecific uses or applications of nanostructures5%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems5%
PatentTitleYear
11,022,882Compound and composition for forming organic film202110,831,102Photoactive polymer brush materials and EUV patterning using the same202010,755,928Fabricating electrically nonconductive blocks using a polymer brush and a sequential infiltration synthesis process202010,748,823Embedded etch rate reference layer for enhanced etch time precision202010,604,618Compound, method for manufacturing the compound, and composition for forming organic film202010,345,700Negative-tone resist compositions and multifunctional polymers therein201910,259,907Block copolymers with surface-active junction groups, compositions and processes thereof201910,118,989Methods of forming block polymers for directed self-assembly201810,066,040Additives for orientation control of block copolymers201810,059,820Hybrid topographical and chemical pre-patterns for directed self-assembly of block copolymers20189,982,097Thin film self assembly of topcoat-free silicon-containing diblock copolymers20189,983,475Fluorinated sulfonate esters of aryl ketones for non-ionic photo-acid generators20189,950,999Non-ionic low diffusing photo-acid generators20189,951,164Non-ionic aryl ketone based polymeric photo-acid generators20189,879,152'Block copolymers for directed self-assembly applications'20189,768,059'High-chi block copolymers for interconnect structures by directed self-assembly'20179,738,765'Hybrid topographical and chemical pre-patterns for directed self-assembly of block copolymers'20179,574,107'Fluoro-alcohol additives for orientation control of block copolymers'20179,562,127'Methods of forming block polymers for directed self-assembly'20179,458,353'Additives for orientation control of block copolymers'20169,422,445'Sulfonamide-containing topcoat and photoresist additive compositions and methods of use'20169,403,854'Cross-metathesis reaction of functionalized and substituted olefins using group 8 transition metal carbene complexes as metathesis catalysts'20169,388,275'Method of ring-opening polymerization, and related compositions and articles'20169,250,529'Photoresist compositions and methods of use in high index immersion lithography'20169,244,345'Non-ionic photo-acid generating polymers for resist applications'20169,238,709'Latent, high-activity olefin metathesis catalysts containing an N-heterocyclic carbene ligand'20169,233,840'Method for improving self-assembled polymer features'20169,223,209'Sulfonamide-containing photoresist compositions and methods of use'20159,223,217'Sulfonamide-containing topcoat and photoresist additive compositions and methods of use'20159,181,426'Method of controlling orientation of domains in block copolymer films'20159,159,558'Methods of reducing defects in directed self-assembled structures'20159,107,291'Formation of a composite pattern including a periodic pattern self-aligned to a prepattern'20158,945,808'Self-topcoating resist for photolithography'20158,940,855'Polymers bearing pendant pentafluorophenyl ester groups, and methods of synthesis and functionalization thereof'20158,871,879'Latent, high-activity olefin metathesis catalysts containing an N-heterocyclic carbene ligand'20148,856,693'Method for designing optical lithography masks for directed self-assembly'20148,841,770'Semiconductor interconnect structure having enhanced performance and reliability'20148,828,493'Methods of directed self-assembly and layered structures formed therefrom'20148,821,978'Methods of directed self-assembly and layered structures formed therefrom'20148,779,166'Polymers bearing pendant pentafluorophenyl ester groups, and methods of synthesis and functionalization thereof'20148,754,208'Method of preparing cyclic carbonates, cyclic carbamates, cyclic ureas, cyclic thiocarbonates, cyclic thiocarbamates, and cyclic dithiocarbonates'20148,734,904'Methods of forming topographical features using segregating polymer mixtures'20148,652,762'Organic graded spin on BARC compositions for high NA lithography'20148,648,465'Semiconductor interconnect structure having enhanced performance and reliability'20148,642,787'Surface modified nanoparticles, methods of their preparation, and uses thereof for gene and drug delivery'20148,623,458'Methods of directed self-assembly, and layered structures formed therefrom'20148,491,965'Method of controlling orientation of domains in block copolymer films'20138,486,489'Methods for aligning polymer films and related structures'20138,476,428'Method of preparing cyclic carbonates, cyclic carbamates, cyclic ureas, cyclic thiocarbonates, cyclic thiocarbamates, and cyclic dithiocarbonates'20138,455,612'Polymers bearing pendant pentafluorophenyl ester groups, and methods of synthesis and functionalization thereof'20138,450,504'Polymers bearing pendant pentafluorophenyl ester groups, and methods of synthesis and functionalization thereof'20138,440,387'Graded topcoat materials for immersion lithography'20138,410,290'Cyclic carbonyl compounds with pendant carbonate groups, preparations thereof, and polymers therefrom'20138,398,868'Directed self-assembly of block copolymers using segmented prepatterns'20138,389,746'Cyclic carbonyl compounds with pendant carbonate groups, preparations thereof, and polymers therefrom'20138,334,088'Functionalized carbosilane polymers and photoresist compositions containing the same'20128,336,003'Method for designing optical lithography masks for directed self-assembly'20128,236,482'Photoresist compositions and methods of use in high index immersion lithography'20128,226,838'Method of forming polymer features by directed self-assembly of block copolymers'20128,226,985'Surface modified nanoparticles, methods of their preparation, and uses thereof for gene and drug delivery'20128,207,351'Cyclic carbonyl compounds with pendant carbonate groups, preparations thereof, and polymers therefrom'20128,178,700'Method of preparing cyclic carbonates, cyclic carbamates, cyclic ureas, cyclic thiocarbonates, cyclic thiocarbamates, and cyclic dithiocarbonates'20128,143,369'Polymers bearing pendant pentafluorophenyl ester groups, and methods of synthesis and functionalization thereof'20128,137,874'Organic graded spin on BARC compositions for high NA lithography'20128,124,327'Method for using compositions containing fluorocarbinols in lithographic processes'20128,114,306'Method of forming sub-lithographic features using directed self-assembly of polymers'20128,084,193'Self-segregating multilayer imaging stack with built-in antireflective properties'20118,003,309'Photoresist compositions and methods of use in high index immersion lithography'20117,989,026'Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films'20117,951,524'Self-topcoating photoresist for photolithography'20117,906,031'Aligning polymer films'20117,883,828'Functionalized carbosilane polymers and photoresist compositions containing the same'20117,824,845'Functionalized carbosilane polymers and photoresist compositions containing the same'20107,816,069'Graded spin-on organic antireflective coating for photolithography'20107,781,157'Method for using compositions containing fluorocarbinols in lithographic processes'20107,763,319'Method of controlling orientation of domains in block copolymer films'20107,678,537'Graded topcoat materials for immersion lithography'20107,588,879'Graded spin-on organic antireflective coating for photolithography'20097,521,090'Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films'20097,521,094'Method of forming polymer features by directed self-assembly of block copolymers'20097,514,063'Method for the purification of semiconducting single walled carbon nanotubes'20097,508,354'Multi-board presentation system'20097,507,854'Impurity reduction in Olefin metathesis reactions'20097,213,211'System for knowledge transfer in a group setting'2007Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2007–2009Based in Indianapolis, IN, US· patent location history
2009–2021Patents assigned to IBM (78)· patent assignee history
2009–2021Based in San Jose, CA, US· patent location history
2009–2016Based in Pasadena, CA, US· patent location history
2011–2016Patents assigned to SANDERS DANIEL P (14)· patent assignee history
2011–2016Patents assigned to CHENG JOY (13)· patent assignee history
2012–2016Patents assigned to SANDERS DANIEL PAUL (22)· patent assignee history
2012–2018Patents assigned to CENTRAL GLASS CO LTD (12)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 78 | 2009–2021 |
| SANDERS DANIEL PAULself | 22 | 2012–2016 |
| SANDERS DANIEL Pself | 14 | 2011–2016 |
| CHENG JOY | 13 | 2011–2016 |
| CENTRAL GLASS CO LTD | 12 | 2012–2018 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Jose, California, US | 78 | 2009–2021 |
| Pasadena, California, US | 4 | 2009–2016 |
| Indianapolis, IN, US | 2 | 2007–2009 |