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Inventor

Ralph Feder

Inventor
Hyde Park, NY, US

Overview

3→
Patents
1976–1981
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices38%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests38%
H05KPrinted circuits13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
PatentTitleYear
4,293,374'High aspect ratio, high resolution mask fabrication'19814,018,938'Fabrication of high aspect ratio masks'19773,984,582'Method for preparing positive resist image'1976

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1976–1981Patents assigned to IBM (3)· patent assignee history
1976–1981Based in Hyde Park, NY, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
IBM31976–1981
Locations
LocationPatentsSpan
Hyde Park, New York, US31976–1981