Inventor

Hidetaka Oka

Inventor

Takarazuka, JP

Overview

2000–2015

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%

C07DHeterocyclic compounds19%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds11%

C07CAcyclic or carbocyclic compounds8%

C09KMaterials for miscellaneous applications, not provided for elsewhere8%

H05BElectric heating7%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%

H10KOrganic electric solid-state devices5%

Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution4%

A61KPreparations for medical, dental or toiletry purposes3%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2000–2010Patents assigned to CIBA SC HOLDING AG (14)· patent assignee history

2000–2015Based in Takarazuka, JP· patent location history

2000–2003Based in Hyogo, JP· patent location history

2002Based in Amagasaki, JP· patent location history

2011–2015Patents assigned to BASF SE (5)· patent assignee history

2011Patents assigned to BASF SE Ludwigshafen (1)· patent assignee history

2014–2015Patents assigned to OKA HIDETAKA (2)· patent assignee history

2014–2015Patents assigned to TANABE JUNICHI (2)· patent assignee history

Assignee and location history derived from the patent record.

Assignees

Locations